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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 972165Generated: October 26, 2026

Silica → Ammonia

https://huagongshe.com/reaction/972165

Reaction equation

Participants

RoleNameHCIDCharge
ReactantSilicaHCID 24261—
ReactantTrisilicon tetranitrideHCID 3084099—
ProductAmmoniaHCID 222—
ProductSilaneHCID 23953—
ProductTrisilicon tetranitrideHCID 3084099—

Reaction Steps

Next, a middle silicon nitride layer 12 is deposited onto the first layer 10 of silicon dioxide previously deposited. Silicon nitride is produced from the reaction of silane (SiH4) with nitrogen and ammonia (NH3). The nitride deposition is performed, for example, in a "pancake style"]reactor. Typically, 3.5 minutes is required to deposit 500 Angstroms of Si3N4 at 800° C.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS04052251
Source datasetuspto-grants-1977_10
ORD IDord-6f007f246b7a4bd4a4b23dffc3c83d94
Source noteuspto-grants-1977_10