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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 976021Generated: October 29, 2026

Chlorotrimethylsilane → HCID 22870460, compound

https://huagongshe.com/reaction/976021

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant9-Fluorenylmethyl chloroformateHCID 34367—
ReactantHCID 86750549HCID 86750549—
SolventDichloromethaneHCID 6344—
SolventHexamethyldisilazaneHCID 13838—
ProductHCID 22870460HCID 22870460—

Reaction Conditions

Temperature0 °C

Reaction Steps

(S,S)-2,7-Diamino-E-oct-4-enedioic acid dihydrochloride (1.59 g, 5.8 mmol) was suspended in HMDS (20 ml) and TMSCl and refluxed overnight. The solvents were removed, and the residue was dissolved in anhydrous dichloromethane. This solution was cooled to 0° C. and a solution of FmocCl (3.10 g, 12 mmol) in dichloromethane was added. The solution was stirred for 1 hour at this temperature and overnight at ambient temperature. The solvent was evaporated and the residue dissolved in THF. After addition of 1N aqueous HCl the solution was stirred for two hours, extracted with chloroform and dried (MgSO4). The residue was dissolved in dichloromethane and crystallized by the addition of diethylether.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05610141
Source datasetuspto-grants-1997_03
ORD IDord-feac30f1e166451c8b7e4bf428483f7b
Source noteuspto-grants-1997_03