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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 981882Generated: October 30, 2026

Chlorotrimethylsilane → HCID 20068396, compound

https://huagongshe.com/reaction/981882

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant1,2-EthanedithiolHCID 10902—
ReactantHCID 20068366HCID 20068366—
SolventDichloromethaneHCID 6344—
ProductHCID 20068396HCID 2006839655.8%

Reaction Steps

To a stirred mixture of 5.1 parts of 1-(1,2,3,4-tetrahydro-2,2-dimethyl-1-naphthalenyl)-1H-imidazole-5-carboxaldehyde, 2.7 parts of 1,2-ethanethiol and 130 parts of dichloromethane were added dropwise 9.6 parts of chlorotrimethylsilane. Upon complete addition, stirring was continued overnight at 40° C. After cooling, the reaction mixture was washed with a potassium carbonate solution 10% in water and water, dried, filtered and evaporated. The residue was purified by column chromatography over silica gel using a mixture of trichloromethane and methanol (98:2 by volume) as eluent. The pure fractions were collected and the eluent was evaporated. The residue was crystallized from 2,2'-oxybispropane. The product was filtered off and dried, yielding 3.69 parts (55.8%) of 5-(1,3-dithiolan-2-yl)-1-(1,2,3,4-tetrahydro-2,2-dimethyl-1-naphthalenyl)-1H-imidazole; mp. 109.3° C. (compound 2.52).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS04994103
Source datasetuspto-grants-1991_02
ORD IDord-0788767cf08d47d090255e256ca511ef
Source noteuspto-grants-1991_02