HuagongsheHuagongshe Chemie-Druckbericht · Nur für Forschungszwecke
Trifluoromethyl trifluoromethanesulfonate
TRIFLUOROMETHYL TRIFLUOROMETHANESULFONATE · Trifluormethyl trifluoromethanesulfonate · Trifluormethyl triflate · TrifluoroMethyltriflate · rifluoromethyltrifluoromethanesulfonate · Trifluoromethyl trifluoromethanesulphonate · Trifluoromethanesulfonate trifluoromethyl ester · Trifluoromethyl 1,1,1-trifluoromethanesulfonate
Identifikatoren & physikalische Daten
| CAS No. | 3582-05-6 |
|---|---|
| Summenformel | C2F6O3S |
| Durchschnittliche Molmasse | 218,08 g/mol |
| Monoisotopische Masse | 217,947234 g/mol |
| SMILES | O=S(=O)(OC(F)(F)F)C(F)(F)F |
| InChIKey | GVZFDPPAJXHNGL-UHFFFAOYSA-N |
| PubChem CID | 337239 |
| EC No. | 805-991-0 |
| DTXSID | DTXSID40320072 |
Chemische & physikalische Eigenschaften
| XLogP | 2,1 |
|---|---|
| Polarare Oberfläche (TPSA) | 51,8 |
| H-Brücken-Donoren | 0 |
| H-Brücken-Akzeptoren | 9 |
| Frei drehbare Bindungen | 1 |
| Schwere Atome | 12 |
| Formalladung | 0 |
| Komplexität | 239 |
| SpringerMaterials Properties | 19F nuclear magnetic resonance spectrum |
| Schmelzpunkt | -108,2°C |
| Siedepunkt | 21°C |
| Dichte | 1.791±0.06 g/cm3(Predicted) |
| Aggregatzustand | liquid |
| Farbe | Clear |
| InChI | InChI=1S/C2F6O3S/c3-1(4,5)11-12(9,10)2(6,7)8 |
| InChIKey | GVZFDPPAJXHNGL-UHFFFAOYSA-N |
| SMILES | C(F)(F)(F)S(OC(F)(F)F)(=O)=O |
| EPA chemische Informationen | Trifluoromethyl trifluoromethanesulfonate (3582-05-6) |
Sicherheit & Vorschriften
| GHS-Einstufung | DangerH314 (93%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]P260, P264, P280, P301+P330+P331, P302+P361+P354, P304+P340, P305+P354+P338, P316, P321, P363, P405, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 43 reports by companies from 4 notifications to the ECHA C&L Inventory. |
|---|---|
| Hazard Classes and Categories | Skin Corr. 1B (93%) |
| UN-Transportnummer | 3308 |
| Zollcode | 2905190098 |
| R-Sätze (R) | 14-34 |
| Sicherheitshinweise (S) | 23-38 |
Anwendungen & Verwendung
Verwenden
Trifluoromethyl Triflate can be used for thermal atomic layer etching processes.