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N-bromobutanimide → 1-(3-Bromo-5-chloro-2-methoxy-4-methylphenyl)ethanone

HRID 1499829
Notizen
Druckvorschau

Reaktionsgleichung

Reaktionsgleichung von HRID 1499829
[Cl:1][C:2]1[C:3]([CH3:13])=[CH:4][C:5]([O:11][CH3:12])=[C:6]([C:8](=[O:10])[CH3:9])[CH:7]=1.[Br:14]N1C(=O)CCC1=O>C(O)(=O)C>[Br:14][C:4]1[C:5]([O:11][CH3:12])=[C:6]([C:8](=[O:10])[CH3:9])[CH:7]=[C:2]([Cl:1])[C:3]=1[CH3:13]
KomponentenReaktionsbedingungenVersuchsvorschriftAufarbeitungQuellen und NachweiseNotizen zur Reaktion

Komponenten

4

Edukt 2

HCID 67184N-bromobutanimideHCID 27576381-(5-Chloro-2-methoxy-4-methylphenyl)-ethanone

Produkt 1

HCID 866667591-(3-Bromo-5-chloro-2-methoxy-4-methylphenyl)ethanoneAusbeute 38 %

Reagenzien, Katalysatoren, Lösungsmittel 1

HCID 176Acetic AcidLösungsmittel

Reaktionsbedingungen

Temperatur
100 °C

Versuchsvorschrift

To a stirred solution of 1-(5-chloro-2-methoxy-4-methylphenyl)ethanone (5.00 g, 25.2 mmol, from Oakwood) in acetic acid (100 mL) was added N-bromosuccinimide (4.93 g, 27.7 mmol) and the resulting mixture heated at 100° C. for 18 hours. After cooling to ambient temperature, the reaction mixture was concentrated in vacuo, then neutralized with sat. sodium bicarbonate, filtered off insoluble succinimide. The filtrate was extracted with EtOAc. The combined organic layers were washed with brine, dried over sodium sulfate, and then concentrated to dryness under reduced pressure. The residue was purified on silica gel, eluting with 0 to 50% EtOAc in hexanes, to give the desired products (2.66 g, 38%). LCMS calculated for C10H11BrClO2(M+H)+: m/z=277.0; found: 277.0. 1H NMR (DMSO-d6, 300 MHz): δ 7.70 (1H, s), 3.77 (3H, s), 2.57 (3H, s), 2.50 (3H, s) ppm.

Aufarbeitung

  1. temperatureAfter cooling to ambient temperature
  2. concentrationthe reaction mixture was concentrated in vacuo
  3. filtrationfiltered off insoluble succinimide
  4. extractionThe filtrate was extracted with EtOAc
  5. washThe combined organic layers were washed with brine
  6. dry with materialdried over sodium sulfate
  7. concentrationconcentrated to dryness under reduced pressure
  8. customThe residue was purified on silica gel
  9. washeluting with 0 to 50% EtOAc in hexanes

Quellen und Nachweise

ORD-Eintrag
ord-4a509d50a2304b14b749b352875409d5
Quelldatensatz
uspto-grants-2015_12
DOI
10.6084/m9.figshare.5104873.v1
Patentnummer
US09199982B2

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