Water → Butanoic acid, 4-[[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]thio]-

HRID 359730

Reaktionsgleichung

Reaktionsgleichung von HRID 359730
[CH3:1][C:2]([C:5]1[CH:10]=[C:9]([SH:11])[CH:8]=[C:7]([C:12]([CH3:15])([CH3:14])[CH3:13])[C:6]=1[OH:16])([CH3:4])[CH3:3].Br[CH2:18][CH2:19][CH2:20][C:21]([O:23]CC)=[O:22].[OH-].[K+].O>CC(C)=O>[CH3:4][C:2]([C:5]1[CH:10]=[C:9]([S:11][CH2:18][CH2:19][CH2:20][C:21]([OH:23])=[O:22])[CH:8]=[C:7]([C:12]([CH3:15])([CH3:14])[CH3:13])[C:6]=1[OH:16])([CH3:1])[CH3:3]

Komponenten

6

Versuchsvorschrift

To a solution of 2,6-bis(1,1-dimethylethyl)-4-mercaptophenol (3.57 g, 15 mmole) and ethyl 4-bromobutyrate (3.23 g, 16.5 mmole) in 10 ml of acetone was added potassium hydroxide flakes (2.52 g, 45 mmole) Water (20 ml) was added and the solution was stirred for 1.5 hours, then concentrated in vacuo to dryness. Water (50 ml) was added to the residue and the aqueous mixture was washed with three portions (75 ml each) of ethyl acetate. The aqueous layer was separated and acidified with concentrated hydrochloric acid and extracted with two portions (50 ml each) of ethyl acetate. The organic layers were combined and washed with water, dried over sodium sulfate, filtered and concentrated in vacuo to an oil. Purification by chromatography on silica gel and recrystallization from diethyl ether-hexane yielded, after collection and drying in vacuo, the title compound, m.p. 112°-113.5°.

Aufarbeitung

  1. additionwas added
  2. concentrationconcentrated in vacuo to dryness
  3. additionWater (50 ml) was added to the residue
  4. washthe aqueous mixture was washed with three portions (75 ml each) of ethyl acetate
  5. customThe aqueous layer was separated
  6. extractionextracted with two portions (50 ml each) of ethyl acetate
  7. washwashed with water
  8. dry with materialdried over sodium sulfate
  9. filtrationfiltered
  10. concentrationconcentrated in vacuo to an oil
  11. customPurification by chromatography
  12. customon silica gel and recrystallization from diethyl ether-hexane
  13. customyielded
  14. customafter collection
  15. customdrying in vacuo

Quellen und Nachweise

ORD-Eintrag
ord-57fb6df0c5b64f429df904cecbeccedd
Quelldatensatz
uspto-grants-1991_03
Patentnummer
US05002967

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