Water → 1-Cyclopropyl-4-nitronaphthalene

HRID 448139

Reaktionsgleichung

Reaktionsgleichung von HRID 448139
[N:1]([O-:3])=[O:2].[Na+].[CH:5]1([C:8]2[C:17]3[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=3)[CH:11]=[CH:10][CH:9]=2)[CH2:7][CH2:6]1.O>CCOC(C)=O>[CH:5]1([C:8]2[C:17]3[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=3)[C:11]([N+:1]([O-:3])=[O:2])=[CH:10][CH:9]=2)[CH2:7][CH2:6]1

Komponenten

5

Edukt 3

HCID 962WaterHCID 146686931-CyclopropylnaphthaleneHCID 23668193Sodium Nitrite

Produkt 1

HCID 598130791-Cyclopropyl-4-nitronaphthaleneAusbeute 64 %

Reagenzien, Katalysatoren, Lösungsmittel 1

HCID 8857Ethyl AcetateLösungsmittel

Reaktionsbedingungen

Temperatur
0 °C

Versuchsvorschrift

Sodium nitrite (30 mL) was slowly added (over 2 hours) to 1-cyclopropyl-naphthalene (6.4 g, 38 mmol) stirred at 0° C. The reaction mixture was stirred at 0° C. for an extra 30 min and then was slowly poured into ice. Water was added, followed by EtOAc. After extraction, the organic layer was washed with a 1% aqueous solution of NaOH, then washed with water, dried over sodium sulfate, filtered and concentrated under reduced pressure. The residue was purified by silica gel chromatography to yield 1-cyclopropyl-4-nitro-naphthalene (5.2 g, 64%).

Aufarbeitung

  1. stirringThe reaction mixture was stirred at 0° C. for an extra 30 min
  2. additionwas slowly poured into ice
  3. extractionAfter extraction
  4. washthe organic layer was washed with a 1% aqueous solution of NaOH
  5. washwashed with water
  6. dry with materialdried over sodium sulfate
  7. filtrationfiltered
  8. concentrationconcentrated under reduced pressure
  9. customThe residue was purified by silica gel chromatography

Quellen und Nachweise

ORD-Eintrag
ord-899fea0b06b243edb9289c36e7685495
Quelldatensatz
uspto-grants-2013_07
Patentnummer
US08481581B2

Verknüpfte Notizen

Wird geladen…