Trifluoromethane → Diethyl bis(trifluoromethyl)silane
Reaktionsgleichung
Cl[Si:2](Cl)([CH2:5][CH3:6])[CH2:3][CH3:4].[CH:8]([F:11])([F:10])[F:9].C[Si]([N-][Si](C)(C)C)(C)C.[K+]>>[CH2:3]([Si:2]([CH2:5][CH3:6])([C:8]([F:11])([F:10])[F:9])[C:8]([F:11])([F:10])[F:9])[CH3:4]Komponenten
4
Versuchsvorschrift
A similar procedure to the one reported in EXAMPLE 2 was followed except dichlorodiethylsilane (5.12 g, 32.5 mmol, 1 eq) was used as the substrate along with 2eq each of CF3H and KHMDS to obtain pure diethyl bis(trifluoromethyl)silane 3.2 g, 44% yield. 1H NMR (400 MHz): δ 1.08 (m, CH2), 1.16 (m, CH3); 13C NMR (100.5 MHz): δ-1.10 (s, CH2), 5.55 (s, CH3), 128.6 (qq, 1JC—F=319 Hz, 3.35 Hz, CF3); 19F NMR (376.3 MHz): δ-60.2 (s); 29Si NMR (79.5 MHz): δ-2.43 (sept, 2JSi—F=39.4 Hz, 1 Si).
Quellen und Nachweise
- ORD-Eintrag
- ord-91a391a409d645d0944cba77728e9673
- Quelldatensatz
- uspto-grants-2016_05
- Patentnummer
- US09334253B2
Notizen zur Reaktion
Wird geladen…