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Potassium Carbonate → 2-Methyl-4-trifluoromethylsulfanyl-2-(2-trifluoromethylsulfanyl-ethanesulfonyl)-butyronitrile

HRID 80410
Notizen
Druckvorschau

Reaktionsgleichung

Reaktionsgleichung von HRID 80410
[F:1][C:2]([S:5][CH2:6][CH2:7][S:8]([CH2:11][C:12]#[N:13])(=[O:10])=[O:9])([F:4])[F:3].[F:14][C:15]([S:18][CH2:19][CH2:20]OS(C(F)(F)F)(=O)=O)([F:17])[F:16].[C:29]([O-])([O-])=O.[K+].[K+]>COCCOC.O>[CH3:29][C:11]([S:8]([CH2:7][CH2:6][S:5][C:2]([F:1])([F:4])[F:3])(=[O:9])=[O:10])([CH2:20][CH2:19][S:18][C:15]([F:17])([F:16])[F:14])[C:12]#[N:13]
KomponentenVersuchsvorschriftAufarbeitungQuellen und NachweiseNotizen zur Reaktion

Komponenten

6

Edukt 3

HCID 11430Potassium CarbonateHCID 252420282-(Trifluoromethylthio)ethyl TrifluoromethanesulfonateHCID 86673275(2-Trifluoromethylsulfanyl-ethanesulfonyl)-acetonitrile

Produkt 1

HCID 866732742-Methyl-4-trifluoromethylsulfanyl-2-(2-trifluoromethylsulfanyl-ethanesulfonyl)-butyronitrile

Reagenzien, Katalysatoren, Lösungsmittel 2

HCID 962
Water
Lösungsmittel
HCID 80711,2-DimethoxyethaneLösungsmittel

Versuchsvorschrift

A mixture of (2-trifluoromethylsulfanyl-ethanesulfonyl)-acetonitrile (190 mg, 0.81 mmol), trifluoro-methanesulfonic acid 2-trifluoromethylsulfanyl-ethyl ester (340 mg, 1.22 mmol) and K2CO3 (340 mg, 2.44 mmol) in 1,2-dimethoxyethane (10 mL) was stirred under nitrogen at room temperature overnight. The reaction mixture was diluted with H2O (40 mL) and extracted with ethyl acetate (3×30 mL). The combined organic extracts were washed with saturated aqueous NaCl solution, dried over Na2SO4 and concentrated under reduced pressure. The residue was purified by flash column chromatography (SiO2, gradient of EtOAc/cyclohexane) to afford compound II-26 (20 mg, 7%).

Aufarbeitung

  1. extractionextracted with ethyl acetate (3×30 mL)
  2. washThe combined organic extracts were washed with saturated aqueous NaCl solution
  3. dry with materialdried over Na2SO4
  4. concentrationconcentrated under reduced pressure
  5. customThe residue was purified by flash column chromatography (SiO2, gradient of EtOAc/cyclohexane)
  6. customto afford compound

Quellen und Nachweise

ORD-Eintrag
ord-b9c21e2525bb471e8f7024d02c8f9b7d
Quelldatensatz
uspto-grants-2014_09
DOI
10.6084/m9.figshare.5104873.v1
Patentnummer
US08846569B2

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