Reaction equation
[C:1]([O:6][CH2:7][Si:8]([CH3:11])([CH3:10])[CH3:9])(=[O:5])[C:2]([CH3:4])=[CH2:3].[C:12]([O:17][C:18]([CH3:26])([CH3:25])[C:19]1[CH:24]=[CH:23][CH:22]=[CH:21][CH:20]=1)(=[O:16])[C:13]([CH3:15])=[CH2:14].CC(N=NC(C#N)(C)C)(C#N)C.CO>C1(C)C=CC=CC=1>[C:1]([O:6][CH2:7][Si:8]([CH3:11])([CH3:9])[CH3:10])(=[O:5])[C:2]([CH3:4])=[CH2:3].[C:12]([O:17][C:18]([CH3:26])([CH3:25])[C:19]1[CH:20]=[CH:21][CH:22]=[CH:23][CH:24]=1)(=[O:16])[C:13]([CH3:15])=[CH2:14]Participants
Procedure
Trimethylsilylmethyl methacrylate (TMSMMA) and dimethylbenzyl methacrylate (DBMA) were mixed in a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer of the toluene solution, of 2,2'-azobis(isobutylonitrile) (AIBN) was added to the solution, and the mixture was retained in an oil bath at 80° C. for 8 hours with stirring. Next, the mixture was left standing to cool at room temperature, was diluted with toluene and was thereafter dropped into large quantities of a methanol solution. The resulting precipitate was filtered and dried to obtain a base polymer as a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/dimethylbenzyl methacrylate copolymer represented by the following formula, ##STR11## wherein each of m and n is a positive integer. In this example, the copolymer described above could be obtained at a yield of 60%, the molecular weight was 27,000 and the dispersion was 1.61.
Workup
- waitNext, the mixture was left
- filtrationThe resulting precipitate was filtered
- customdried
- customto obtain a base polymer as a resist material
Sources & evidence
- ORD record
- ord-f0a2053055f94cdca01b38a00b7e9686
- Source dataset
- uspto-grants-1999_01
- Patent number
- US05856071
Linked notes
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