Water → HCID 86753512, compound

HRID 341724

Reaction equation

HRID 341724 reaction equation
[C:1]([O:6][CH2:7][Si:8]([CH3:11])([CH3:10])[CH3:9])(=[O:5])[C:2]([CH3:4])=[CH2:3].[C:12]([O:17][CH:18]1[CH2:23][CH2:22][CH2:21][CH2:20][O:19]1)(=[O:16])[C:13]([CH3:15])=[CH2:14].CC(N=NC(C#N)(C)C)(C#N)C.O>C1(C)C=CC=CC=1.CO>[C:1]([O:6][CH2:7][Si:8]([CH3:11])([CH3:9])[CH3:10])(=[O:5])[C:2]([CH3:4])=[CH2:3].[C:12]([O:17][CH:18]1[CH2:23][CH2:22][CH2:21][CH2:20][O:19]1)(=[O:16])[C:13]([CH3:15])=[CH2:14]

Participants

7

Reactant 4

HCID 962WaterHCID 6547AzobisisobutyronitrileHCID 2760855MethacryloxymethyltrimethylsilaneHCID 11041138Tetrahydropyranyl methacrylate

Product 1

HCID 86753512HCID 86753512, compoundYield 90%

Reagents, catalysts & solvents 2

HCID 887MethanolSolventHCID 1140TolueneSolvent2×

Procedure

Trimethylsilylmethyl methacrylate (TMSMMA) and tetrahydropyranyl methacrylate (THPMA) were mixed at a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer, of AIBN was added to the mixture, and the mixture was retained in an oil bath at 80° C. for 7 hours with stirring. Next, the mixture was left standing to cool to room temperature. After the mixture was diluted with toluene, it was dropped into large quantities of a mixed solvent of water and methanol having a mixing ratio of 1:20, and the resulting precipitate was filtered and dried to obtain a base polymer of a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/tetrahydropyranyl methacrylate copolymer represented by the following formula, ##STR13## wherein each of m and n is a positive integer.

Workup

  1. waitNext, the mixture was left
  2. filtrationthe resulting precipitate was filtered
  3. customdried
  4. customto obtain a base polymer of a resist material

Sources & evidence

ORD record
ord-93bf5aa2af9940449353ee994ac951e2
Source dataset
uspto-grants-1999_01
Patent number
US05856071

Linked notes

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