Silica → Ammonia

HRID 972165

Reaction equation

HRID 972165 reaction equation
[N:1]12[Si:6]34[N:7]5[Si:4]61[N:5]3[Si:2]25[N:3]64.[Si:8](=O)=O>>[N:1]12[Si:6]34[N:7]5[Si:4]61[N:5]3[Si:2]25[N:3]64.[SiH4:8].[NH3:1]

Participants

5

Reactant 2

HCID 24261SilicaHCID 3084099Trisilicon tetranitride

Product 3

HCID 222AmmoniaHCID 23953SilaneHCID 3084099Trisilicon tetranitride

Procedure

Next, a middle silicon nitride layer 12 is deposited onto the first layer 10 of silicon dioxide previously deposited. Silicon nitride is produced from the reaction of silane (SiH4) with nitrogen and ammonia (NH3). The nitride deposition is performed, for example, in a "pancake style"]reactor. Typically, 3.5 minutes is required to deposit 500 Angstroms of Si3N4 at 800° C.

Sources & evidence

ORD record
ord-6f007f246b7a4bd4a4b23dffc3c83d94
Source dataset
uspto-grants-1977_10
Patent number
US04052251

Linked notes

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