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HCID 83050作成日:2026年10月26日

3-ヒドロキシベンゾフェノン

3-ヒドロキシベンゾフェノン · (3-ヒドロキシフェニル)(フェニル)メタノン · 3-ベンゾイルフェノール · m-ヒドロキシベンゾフェノン · M-BENZOYL PHENOL · 3-Hydroxybenzophenone · M-HYDROXYBENZOPHENONE · 3-Hydroxybenzophenone,99%

https://huagongshe.com/ja/chemical/83050

3-ヒドロキシベンゾフェノン の分子構造式

識別子と物理属性

CAS No.13020-57-0
分子式C13H10O2
平均分子量198.22 g/mol
単同位体質量198.06807956 g/mol
SMILESO=C(c1ccccc1)c1cccc(O)c1
InChIKeySHULEACXTONYPS-UHFFFAOYSA-N
PubChem CID83050
ChEMBLCHEMBL107103
EC No.235-879-1
DTXSIDDTXSID4047880
現地名3-ヒドロキシベンゾフェノン

化学・物理的性質

XLogP3
極性表面積37.3
水素結合供与体数1
水素結合受容体数2
回転可能結合数2
重原子数15
形式電荷0
複雑度219
Endocrine DisruptorsPotential endocrine disrupting compound
融点113-115 °C (lit.)
沸点295.53°C (rough estimate)
密度1.1184 (rough estimate)
屈折率1.5954 (estimate)
貯蔵条件Inert atmosphere,Room Temperature
溶解度クロロホルム、DCM に可溶。酢酸エチル。
pKa(酸解離定数)9.18±0.10(Predicted)
外観・状態個体
色白い
InChI1S/C13H10O2/c14-12-8-4-7-11(9-12)13(15)10-5-2-1-3-6-10/h1-9,14H
InChIKeySHULEACXTONYPS-UHFFFAOYSA-N
SMILESOc1cccc(c1)C(=O)c2ccccc2
CAS データベース13020-57-0(CAS DataBase Reference)
NISTの化学物質情報M-hydroxybenzophenone(13020-57-0)

化学的特性

light beige to brown-grey crystalline powder

安全性と法規制

GHS 分類WarningH315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 44 reports by companies from 4 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.
Hazard Classes and CategoriesSkin Irrit. 2 (100%)
水環境危害等級(WGK)3
RTECS 番号PC4959730
税関コード29145090
危険文句(R)36/37/38
危険表示Xi
安全措置(S)26-37/39-36
危険等級IRRITANTEye Irrit. 2Skin Irrit. 2STOT SE 3
貯蔵分類11 - Combustible Solids

用途

使用

3-Hydroxybenzophenone is a benzophenone metabolite with potential estrogenic and anti-androgenic activity. is a more attractive hydrogen bonding co-material for MCPBA, as the 3-hydroxyl group is unable to form an intramolecular hydrogen bond. It is commonly used as a radical and cationic photo initiators.

製法・合成法

製造方法

Preparation by aromatization of 5-benzoyl-2- cyclohexenone, in the presence of 10% Pd/C in refluxing xylene for 6 h (60%) in the presence of lithium bromide and cupric bromide in refluxing acetonitrile for 1 h (75%).