Hydrochloric Acid → HCID 67021617、化合物
反応式
I[C:2]1[CH:7]=[CH:6][C:5]([CH2:8][C:9]([OH:11])=[O:10])=[CH:4][CH:3]=1.[N:12]1[C:16]2[CH:17]=[CH:18][CH:19]=[CH:20][C:15]=2[NH:14][CH:13]=1.N1C2C(=CC=C3C=2N=CC=C3)C=CC=1.C([O-])([O-])=O.[Cs+].[Cs+].Cl>C1(C)C(C)=CC=CC=1.[OH-].[Na+].C(=C/C(/C=C/C1C=CC=CC=1)=O)\C1C=CC=CC=1>[N:12]1([C:2]2[CH:7]=[CH:6][C:5]([CH2:8][C:9]([OH:11])=[O:10])=[CH:4][CH:3]=2)[C:16]2[CH:17]=[CH:18][CH:19]=[CH:20][C:15]=2[N:14]=[CH:13]1参加物
反応条件
- 温度
- 125 °C
実験手順
A mixture of 4.4 g of 4-iodophenylacetic acid, 2.98 g of benzoimidazole, 197 mg of trans,trans-dibenzylideneacetone, 3.33 g of 1,10-phenanthroline, 211 mg of copper (I) trifluoromethanesulfonate benzene complex and 6 g of Cs2CO3 in 12 ml of xylene is stirred for 88 hours at 125° C. The mixture obtained is allowed to cool to rt and concentrated in vacuo. The concentration residue obtained is dissolved in 1N NaOH aqueous solution and the mixture obtained is extracted with EtOAc. The pH of the aqueous layer obtained is adjusted to acidic pH by addition of 1N HCl aqueous solution. A precipitate forms and is collected by vacuum filtration (batch 1) is collected by vacuum filtration. The aqueous phase from the filtrate obtained is extracted with CH2Cl2. The organic phase is dried (Na2SO4), filtered and concentrated. The concentration residue obtained (batch 2) is combined with batch 1 and triturated in Et2O. 3.58 g of (4-benzoimidazol-1-yl-phenyl)-acetic acid are obtained.
後処理
- customThe mixture obtained
- temperatureto cool to rt
- concentrationconcentrated in vacuo
- customThe concentration residue obtained
- customthe mixture obtained
- extractionis extracted with EtOAc
- customThe pH of the aqueous layer obtained
- filtrationA precipitate forms and is collected by vacuum filtration (batch 1)
- filtrationis collected by vacuum filtration
- customThe aqueous phase from the filtrate obtained
- extractionis extracted with CH2Cl2
- dry with materialThe organic phase is dried (Na2SO4)
- filtrationfiltered
- concentrationconcentrated
- customThe concentration residue obtained (batch 2)
- customtriturated in Et2O
出典と根拠
- ORDレコード
- ord-91e6258dec0a4b6aa63f7a44459051c4
- 出典データセット
- uspto-grants-2011_07
- 特許番号
- US07977338B2
反応ノート
読み込み中…