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Phenol → HCID 86710600、化合物

HRID 1027203
ノート
印刷プレビュー

反応式

HRID 1027203 の反応式
C1(O)C=CC=CC=1.C([O-])([O-])=O.[Cs+].[Cs+].[CH2:14]([O:21][C:22]1[CH:31]=[C:30]2[C:25]([CH:26]=[CH:27][C:28]([OH:32])=[CH:29]2)=[CH:24][C:23]=1[Br:33])[C:15]1[CH:20]=[CH:19][CH:18]=[CH:17][CH:16]=1.Br[CH2:35][CH2:36][CH2:37][O:38][CH2:39][C:40]1[CH:45]=[CH:44][CH:43]=[CH:42][CH:41]=1.[Na+].[I-]>CC(C)=O.CCOC(C)=O>[CH2:14]([O:21][C:22]1[C:23]([Br:33])=[CH:24][C:25]2[C:30]([CH:31]=1)=[CH:29][C:28]([O:32][CH2:35][CH2:36][CH2:37][O:38][CH2:39][C:40]1[CH:45]=[CH:44][CH:43]=[CH:42][CH:41]=1)=[CH:27][CH:26]=2)[C:15]1[CH:16]=[CH:17][CH:18]=[CH:19][CH:20]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

8

反応物 5

HCID 996PhenolHCID 5238Sodium IodideHCID 10796Cesium carbonateHCID 2776064Benzyl 3-Bromopropyl EtherHCID 748928207-(Benzyloxy)-6-bromonaphthalen-2-ol

生成物 1

HCID 86710600HCID 86710600、化合物収率 60%

試薬・触媒・溶媒 2

HCID 180
Acetone
溶媒
HCID 8857Ethyl Acetate溶媒

反応条件

温度
60 °C

実験手順

Following GENERAL METHOD 5-1 for phenol alkylation, Cs2CO3 (485 mg, 1.489 mmol) was added to a solution of 7-(benzyloxy)-6-bromonaphthalen-2-ol (490 mg, 1.489 mmol) in acetone (14.90 mL) at RT. The reaction mixture was stirred for 5 min then ((3-bromopropoxy)methyl)benzene (682 mg, 2.98 mmol) was added, followed by addition of NaI (446 mg, 2.98 mmol). The reaction mixture was heated to 60° C. and stirred overnight, then filtered, washed with acetone and concentrated in vacuo. The resulting residue was partitioned between Et2O (60 mL) and water (20 mL). After separation, the organic layer was washed with saturated aq. sodium sulfite solution (20 mL), 2 M Na2CO3, and brine. The organic layer was then dried over MgSO4, filtered, and concentrated in vacuo. Silica gel chromatography (10-60% EtOAc/heptane) afforded 3-(benzyloxy)-6-(3-(benzyloxy)propoxy)-2-bromonaphthalene (422 mg, 0.884 mmol, 60% yield) as a white solid (eluting at 30% EtOAc). LCMS Rt=1.81 min (condition C); LCMS (M+1)=479.9.

後処理

  1. stirringstirred overnight
  2. filtrationfiltered
  3. washwashed with acetone
  4. concentrationconcentrated in vacuo
  5. customThe resulting residue was partitioned between Et2O (60 mL) and water (20 mL)
  6. customAfter separation
  7. washthe organic layer was washed with saturated aq. sodium sulfite solution (20 mL), 2 M Na2CO3, and brine
  8. dry with materialThe organic layer was then dried over MgSO4
  9. filtrationfiltered
  10. concentrationconcentrated in vacuo
  11. customSilica gel chromatography (10-60% EtOAc/heptane) afforded

出典と根拠

ORDレコード
ord-30b2cd6d0bc647359469a82493569f6d
出典データセット
uspto-grants-2014_05
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08729263B2

反応ノート

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