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Sodium Hydroxide → 3-bromo-5-nito-1-(difluoromethoxy)benzene

HRID 1043710
ノート
印刷プレビュー

反応式

HRID 1043710 の反応式
[Br:1][C:2]1[CH:3]=[C:4]([OH:11])[CH:5]=[C:6]([N+:8]([O-:10])=[O:9])[CH:7]=1.[OH-].[Na+].Cl[C:15]([F:20])([F:19])C([O-])=O.[Na+]>CN(C=O)C>[Br:1][C:2]1[CH:7]=[C:6]([N+:8]([O-:10])=[O:9])[CH:5]=[C:4]([O:11][CH:15]([F:20])[F:19])[CH:3]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

5

反応物 3

HCID 14798Sodium HydroxideHCID 2734985Sodium chlorodifluoroacetateHCID 104889843-Bromo-5-nitrophenol

生成物 1

HCID 670535603-bromo-5-nito-1-(difluoromethoxy)benzene収率 4.2%

試薬・触媒・溶媒 1

HCID 6228Dimethylformamide溶媒

反応条件

温度
55 °C

実験手順

To a solution of 3-bromo-5-nitrophenol (3.1 g, 14.4 mmol) and powdered sodium hydroxide (0.63 g, 15.8 mmol) in DMF (14 mL), sodium chlorodifluoroacetate (4.4 g, 28.7 mmol) was added in five portions every 0.5 hour to the warmed reaction mixture at to 55° C. The reaction was maintained at to 55° C. for 1 day and then allowed to cool to room temperature. The reaction mixture was partitioned between EtOAc and water, the layers separated, and the aqueous portion was extracted (2×25 mL) EtOAc and the combined organic layers were washed with aqueous 1.0 M NaOH solution (3×25 mL), water (3×25 mL) and brine (50 mL). The organic layer was dried (MgSO4), and concentrated. The resulting residue was purified by flash chromatography (SiO2, 0-50% EtOAc in hexanes) to afford 1-bromo-3-(difluoromethoxy)-5-nitrobenzene (160 mg, 0.6 mmol). 1H NMR (400 MHz, CDCl3) δ 6.61 (t, J=71.6 Hz, 1H) 7.65 (s, 1H) 7.96 (s, 1H) 8.21-8.31 (m, 1H).

後処理

  1. temperatureto cool to room temperature
  2. customThe reaction mixture was partitioned between EtOAc and water
  3. customthe layers separated
  4. extractionthe aqueous portion was extracted (2×25 mL) EtOAc
  5. washthe combined organic layers were washed with aqueous 1.0 M NaOH solution (3×25 mL), water (3×25 mL) and brine (50 mL)
  6. dry with materialThe organic layer was dried (MgSO4)
  7. concentrationconcentrated
  8. customThe resulting residue was purified by flash chromatography (SiO2, 0-50% EtOAc in hexanes)

出典と根拠

ORDレコード
ord-924cad45cc4e4c358205b612b6332001
出典データセット
uspto-grants-2013_10
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08563553B2

反応ノート

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