N-(3-{6-[1-(4-Methoxybenzyl)-1H-pyrazol-4-yl]-1H-imidazo[1,2-b]pyrazol-1-yl}-4-methyl-phenyl)-3-(4-methylpiperazin-1-yl)-5-(pentafluoro-lambda6-sulphanyl)benzamide → 3-(4-Methylpiperazin-1-yl)-N-{4-methyl-3-[6-(1H-pyrazol-4-yl)-1H-imidazo[1,2-b]pyrazol-1-yl]-phenyl}-5-(pentafluoro-lambda6-sulphanyl)benzamide
反応式
COC1C=CC(C[N:8]2[CH:12]=[C:11]([C:13]3[CH:14]=[C:15]4[N:20]([C:21]5[CH:22]=[C:23]([NH:28][C:29](=[O:49])[C:30]6[CH:35]=[C:34]([S:36]([F:41])([F:40])([F:39])([F:38])[F:37])[CH:33]=[C:32]([N:42]7[CH2:47][CH2:46][N:45]([CH3:48])[CH2:44][CH2:43]7)[CH:31]=6)[CH:24]=[CH:25][C:26]=5[CH3:27])[CH:19]=[CH:18][N:16]4[N:17]=3)[CH:10]=[N:9]2)=CC=1>FC(F)(F)C(O)=O>[CH3:48][N:45]1[CH2:46][CH2:47][N:42]([C:32]2[CH:31]=[C:30]([CH:35]=[C:34]([S:36]([F:41])([F:38])([F:37])([F:39])[F:40])[CH:33]=2)[C:29]([NH:28][C:23]2[CH:24]=[CH:25][C:26]([CH3:27])=[C:21]([N:20]3[C:15]4[N:16]([N:17]=[C:13]([C:11]5[CH:10]=[N:9][NH:8][CH:12]=5)[CH:14]=4)[CH:18]=[CH:19]3)[CH:22]=2)=[O:49])[CH2:43][CH2:44]1参加物
3
反応物 1
生成物 1
試薬・触媒・溶媒 1
実験手順
At 80° C., 90 mg (0.12 mmol) of the compound of Example 48A were stirred in 0.61 ml of trifluoroacetic acid for 3 h. The reaction was then concentrated and the residue was purified by preparative HPLC (Method 18). The product fractions were concentrated, and the residue was dissolved in ethyl acetate and washed successively with saturated potassium carbonate solution and saturated sodium chloride solution. The organic phase was dried over sodium sulphate, filtered and concentrated under reduced pressure. Drying of the residue under high vacuum gave 40 mg (53% of theory) of the title compound.
後処理
- concentrationThe reaction was then concentrated
- customthe residue was purified by preparative HPLC (Method 18)
- concentrationThe product fractions were concentrated
- dissolutionthe residue was dissolved in ethyl acetate
- washwashed successively with saturated potassium carbonate solution and saturated sodium chloride solution
- dry with materialThe organic phase was dried over sodium sulphate
- filtrationfiltered
- concentrationconcentrated under reduced pressure
- customDrying of the residue under high vacuum
出典と根拠
- ORDレコード
- ord-e0d1b8d4bccd43ed93c9ced54555c752
- 出典データセット
- uspto-grants-2016_07
- 特許番号
- US09394309B2
反応ノート
読み込み中…