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Benzene → HCID 86657328、化合物

HRID 1097404
ノート
印刷プレビュー

反応式

HRID 1097404 の反応式
[H-].[Na+].CCOP([O:11][C:12]([CH3:14])=[O:13])(OCC)=O.[CH2:15]1[CH2:26][C:25]2[C:20](=[CH:21][CH:22]=[CH:23][CH:24]=2)[C:18](=O)[CH2:17][CH2:16]1.[Cl-].[NH4+].[CH:29]1C=CC=C[CH:30]=1>>[CH:24]1[C:25]2[CH2:26][CH2:15][CH2:16][CH2:17][C:18](=[CH:14][C:12]([O:11][CH2:29][CH3:30])=[O:13])[C:20]=2[CH:21]=[CH:22][CH:23]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

6

反応物 5

HCID 241Benzene3 回HCID 18353Acetic acid, anhydride with diethyl hydrogen phosphateHCID 24758Sodium hydrideHCID 25517Ammonium ChlorideHCID 70003Benzosuberone

生成物 1

HCID 86657328HCID 86657328、化合物

反応条件

温度
0 °C

実験手順

A suspension of sodium hydride (60%, 2.25 g) in anhydrous benzene (100 ml) was slowly added with a solution of diethyl phosphonoacetate (14.0 g) in anhydrous benzene (20 ml) at 0° C., and the mixture was stirred at 0° C. for 15 minutes. The mixture was added with a solution of 1-benzosuberone (5.00 g) in anhydrous benzene (30 ml), and the mixture was stirred at 0° C. for 15 minutes, and then refluxed overnight by heating. The reaction mixture was left to cool and then added with saturated aqueous ammonium chloride, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, and dried over anhydrous sodium sulfate. The organic layer was concentrated under reduced pressure, and the resulting residue was purified by silica gel column chromatography (developing solvent: ethyl acetate:n-hexane=1:200) to quantitatively obtain the title compound.

後処理

  1. stirringthe mixture was stirred at 0° C. for 15 minutes
  2. temperaturerefluxed overnight
  3. temperatureby heating
  4. waitThe reaction mixture was left
  5. temperatureto cool
  6. extractionthe mixture was extracted with ethyl acetate
  7. washThe organic layer was washed successively with water and saturated brine
  8. dry with materialdried over anhydrous sodium sulfate
  9. concentrationThe organic layer was concentrated under reduced pressure
  10. customthe resulting residue was purified by silica gel column chromatography (developing solvent: ethyl acetate:n-hexane=1:200)

出典と根拠

ORDレコード
ord-3b6dd7425ca34369a979590f0d38d2b6
出典データセット
uspto-grants-2012_03
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08143260B2

反応ノート

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