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Oxalyl chloride → HCID 17915532、化合物

HRID 1107163
ノート
印刷プレビュー

反応式

HRID 1107163 の反応式
[CH3:1][O:2][C:3]1[CH:4]=[C:5]([S:11]([CH:14]([CH2:21][CH2:22][CH2:23][CH2:24][C:25]2[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=2)[C:15]([CH3:20])([CH3:19])[C:16](O)=[O:17])(=[O:13])=[O:12])[CH:6]=[CH:7][C:8]=1[O:9][CH3:10].C(Cl)(=O)C(Cl)=O.C[Si]([NH:41][OH:42])(C)C>C(Cl)Cl>[OH:42][NH:41][C:16](=[O:17])[C:15]([CH3:20])([CH3:19])[CH:14]([S:11]([C:5]1[CH:6]=[CH:7][C:8]([O:9][CH3:10])=[C:3]([O:2][CH3:1])[CH:4]=1)(=[O:13])=[O:12])[CH2:21][CH2:22][CH2:23][CH2:24][C:25]1[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=1
参加物実験手順後処理出典と根拠反応ノート

参加物

5

反応物 3

HCID 65578Oxalyl chlorideHCID 18790105HCID 18790105、化合物HCID 21936899N-Hydroxy-1,1,1-trimethylsilanamine

生成物 1

HCID 17915532HCID 17915532、化合物収率 83%

試薬・触媒・溶媒 1

HCID 6344Dichloromethane溶媒2 回

実験手順

3-(3,4-Dimethoxyphenylsulfonyl)-2,2-dimethyl-7-phenylheptanoic acid (0.5 g, 1.2 mmol) is dissolved in CH2Cl2 (6 mL), cooled in ice and 2 M oxalyl chloride in CH2Cl2 (1.7 mL, 3.5 mmol) is added. The reaction is warmed to room temperature and after 4 hours the solvent is removed in vacuo and the residue azeotroped twice with chloroform. The residue is dissolved in CH2Cl2 (4 mL) and trimethylsilylhydroxylamine (0.42 mL, 3.6 mmol) is added. The reaction is stirred 15 minutes and then the solvent is removed in vacuo, CH2Cl2 (10 mL) added and the solution washed with 1 N HCl. The organic layer is dried over MgSO4 and the solvent removed in vacuo to yield 3-(3,4-dimethoxybenzenesulfonyl)-2,2-dimethyl-7-phenylheptanoic acid hydroxyamide (0.34 g, 83%): 1H NMR (300 MHz, CD3OD) δ 7.45 (dd, J=8.3, 2.0 Hz, 1H), 7.38 (d, J=2.2 Hz, 1H), 7.21-7.05 (m, 4H), 6.98-6.95 (m, 2H), 3.89 (s, 3H), 3.88 (s, 3H), 3.86-3.84 (m, 1H), 2.38-2.33 (m, 2H), 1.93-1.84 (m, 1H), 1.69-1.64 (m, 1H), 1.43 (s, 3H), 1.34-1.23 (m, 3H), 1.23 (s, 3H), 0.98-0.85 (m, 1H); MS (FAB) m/e 450 (M+H)+.

後処理

  1. temperaturecooled in ice
  2. customis removed in vacuo
  3. customthe residue azeotroped twice with chloroform
  4. dissolutionThe residue is dissolved in CH2Cl2 (4 mL)
  5. customthe solvent is removed in vacuo, CH2Cl2 (10 mL)
  6. additionadded
  7. washthe solution washed with 1 N HCl
  8. dry with materialThe organic layer is dried over MgSO4
  9. customthe solvent removed in vacuo

出典と根拠

ORDレコード
ord-e6549b80a82e4bbaab3bcd87bd594969
出典データセット
uspto-grants-2000_05
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US06057369

反応ノート

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