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m-Chloroperbenzoic acid → 3-(3,4-Dichlorophenyl)-3,4-epoxy-1-butanol t-butyldimethylsilyl ether

HRID 1279347
ノート
印刷プレビュー

反応式

HRID 1279347 の反応式
[Si:1]([O:8][CH2:9][CH2:10][C:11]([C:13]1[CH:18]=[CH:17][C:16]([Cl:19])=[C:15]([Cl:20])[CH:14]=1)=[CH2:12])([C:4]([CH3:7])([CH3:6])[CH3:5])([CH3:3])[CH3:2].C(=O)([O-])[OH:22].[Na+].ClC1C=CC=C(C(OO)=O)C=1>C(Cl)Cl>[Si:1]([O:8][CH2:9][CH2:10][C:11]1([C:13]2[CH:18]=[CH:17][C:16]([Cl:19])=[C:15]([Cl:20])[CH:14]=2)[O:22][CH2:12]1)([C:4]([CH3:6])([CH3:7])[CH3:5])([CH3:3])[CH3:2]
参加物実験手順後処理出典と根拠反応ノート

参加物

5

反応物 3

HCID 70297m-Chloroperbenzoic acidHCID 516892Sodium BicarbonateHCID 108712633-(3,4-Dichlorophenyl)-3-butenol t-butyldimethylsilyl ether

生成物 1

HCID 572763533-(3,4-Dichlorophenyl)-3,4-epoxy-1-butanol t-butyldimethylsilyl ether収率 85.9%

試薬・触媒・溶媒 1

HCID 6344Dichloromethane溶媒2 回

実験手順

3.00 g (9.05 mmole) of 3-(3,4-dichlorophenyl)-3-butenol t-butyldimethylsilyl ether [prepared as described in Example 1(b)] were dissolved in 60 ml of methylene chloride, and 2.52 g (30.0 mmole) of sodium hydrogencarbonate and 3.88 g (15.7 mmole) of 3-chloroperbenzoic acid (content: 70%) were added to the resulting solution. The mixture was then stirred at room temperature for 3 hours. At the end of this time, the reaction mixture was diluted with methylene chloride and then washed with a 1 N aqueous solution of sodium hydroxide and with a saturated aqueous solution of sodium chloride. The organic layer was then dried over anhydrous sodium sulfate, and the solvent was removed by evaporation under reduced pressure. The resulting residue was then purified by silica gel column chromatography, using a gradient elution method, with mixtures of hexane and diethyl ether ranging from 24:1 to 19:1 by volume as the eluent, to obtain 2.70 g of the title compound.

後処理

  1. washwashed with a 1 N aqueous solution of sodium hydroxide and with a saturated aqueous solution of sodium chloride
  2. dry with materialThe organic layer was then dried over anhydrous sodium sulfate
  3. customthe solvent was removed by evaporation under reduced pressure
  4. customThe resulting residue was then purified by silica gel column chromatography
  5. washa gradient elution method

出典と根拠

ORDレコード
ord-b2a0c534395a40f3b154128206d975aa
出典データセット
uspto-grants-2002_09
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US06448247B1

反応ノート

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