Potassium Hydroxide → (E)-2-methyl-5-(2-(pyridin-4-yl)prop-1-enyl)-2,3,4,5-tetrahydro-1H-pyrido[4,3-b]indole

HRID 1401494ノート

反応式

HRID 1401494 の反応式
[CH3:1][N:2]1[CH2:24][CH2:23][C:5]2[N:6]([CH2:13][C:14]([C:17]3[CH:22]=[CH:21][N:20]=[CH:19][CH:18]=3)(O)[CH3:15])[C:7]3[CH:8]=[CH:9][CH:10]=[CH:11][C:12]=3[C:4]=2[CH2:3]1.[OH-].[K+]>S(Cl)(Cl)=O>[CH3:1][N:2]1[CH2:24][CH2:23][C:5]2[N:6](/[CH:13]=[C:14](/[C:17]3[CH:18]=[CH:19][N:20]=[CH:21][CH:22]=3)\[CH3:15])[C:7]3[CH:8]=[CH:9][CH:10]=[CH:11][C:12]=3[C:4]=2[CH2:3]1

参加物

4

反応物 2

HCID 14797Potassium HydroxideHCID 497795901-(2-methyl-3,4-dihydro-1H-pyrido[4,3-b]indol-5(2H)-yl)-2-(pyridin-4-yl)propan-2-ol

生成物 1

HCID 59454924(E)-2-methyl-5-(2-(pyridin-4-yl)prop-1-enyl)-2,3,4,5-tetrahydro-1H-pyrido[4,3-b]indole

試薬・触媒・溶媒 1

HCID 24386Thionyl Chloride溶媒

反応条件

温度
100 °C

実験手順

1-(1,2,3,4-Tetrahydro-2-methylpyrido[4,3-b]indol-5-yl)-2-(pyridin-4-yl)propan-2-ol (600 mg, 1.86 mmol) was dissolved in thionyl chloride (8 mL) and the solution was stirred for 1 h. Excess thionyl chloride was removed under reduced pressure and the residue was dissolved in N-methyl-2-pyrrolidone (3 mL) and the solution was stirred for 5 min. at RT. Powdered KOH (690 mg, 12.32 mmol) was added and the reaction mixture was heated at 100° C. for 1-2 h. The reaction mixture was cooled to RT, diluted with ice water and extracted with EtOAc. The organic layer washed with water, dried over sodium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel chromatography eluting with 2% MeOH-DCM. 1H NMR (CD3OD, HCl salt) δ (ppm): 8.85 (d, 2H), 8.40 (d, 2H), 7.82 (d, 1H), 7.60 (d, 1H), 7.30 (m, 2H), 7.20 (m, 1H), 4.80 (d, 1H), 4.40 (d, 1H), 3.90 (m, 1H), 3.60 (m, 2H), 3.20 (m, 1H), 3.10 (s, 3H), 2.20 (s, 3H).

後処理

  1. customExcess thionyl chloride was removed under reduced pressure
  2. dissolutionthe residue was dissolved in N-methyl-2-pyrrolidone (3 mL)
  3. stirringthe solution was stirred for 5 min. at RT
  4. temperatureThe reaction mixture was cooled to RT
  5. extractionextracted with EtOAc
  6. washThe organic layer washed with water
  7. dry with materialdried over sodium sulfate
  8. concentrationconcentrated under reduced pressure
  9. customThe residue was purified by silica gel chromatography
  10. washeluting with 2% MeOH-DCM

出典と根拠

ORDレコード
ord-ace6d5b139eb45fdaec7ef174cfb6e66
出典データセット
uspto-grants-2014_12
特許番号
US08907097B2

反応ノート

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