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Hydrogen Peroxide → 2-Cyclopentylmethyl-3-[formyl-(tetrahydro-pyran-2-yloxy)-amino]-propionic acid

HRID 1434904
ノート
印刷プレビュー

反応式

HRID 1434904 の反応式
C(C1COC(=O)N1[C:14](=[O:33])[CH:15]([CH2:27][CH:28]1[CH2:32][CH2:31][CH2:30][CH2:29]1)[CH2:16][N:17]([O:20][CH:21]1[CH2:26][CH2:25][CH2:24][CH2:23][O:22]1)[CH:18]=[O:19])C1C=CC=CC=1.C1C[O:37]CC1.O.OO>[Cl-].[Na+].O>[CH:28]1([CH2:27][CH:15]([CH2:16][N:17]([CH:18]=[O:19])[O:20][CH:21]2[CH2:26][CH2:25][CH2:24][CH2:23][O:22]2)[C:14]([OH:33])=[O:37])[CH2:29][CH2:30][CH2:31][CH2:32]1
参加物実験手順後処理出典と根拠反応ノート

参加物

6

反応物 4

HCID 784Hydrogen PeroxideHCID 962WaterHCID 8028TetrahydrofuranHCID 76652336HCID 76652336、化合物

生成物 1

HCID 766523532-Cyclopentylmethyl-3-[formyl-(tetrahydro-pyran-2-yloxy)-amino]-propionic acid収率 50%

試薬・触媒・溶媒 1

HCID 57417360Sodium chloride; water
溶媒

実験手順

N-[3-(4-Benzyl-2-oxo-oxazolidin-3-yl)-2-cyclopentylmethyl-3-oxo-propyl]-N-(tetrahydro-pyran-2-yloxy)-formamide (3.65 g, 7.96 mmol), THF (125 mL), and water (40 mL) is cooled to 4° C. To this mixture, is added 30% H2O2 (5.2 mL, 50.90 mmole) and LiOH monohydrate (0.40 g, 9.53 mmol), respectively. The reaction mixture is stirred for 1.5 hours. The mixture is slowly quenched with 0.5 M Na2SO3, while maintaining the temperature below 15° C. with an ice bath. The quenched mixture is stirred for an addition 30 minutes, concentrated in vacuo until the THF solvent is removed, and washed with EtOAc. The basic reaction mixture is acidified with Amberlite IR-120 resin (H+) to pH=4.5. Brine is added to the acidic solution, and the combined mixture is extracted with EtOAc. The organic layers from the acidic solution washing are combined, dried over Na2SO4, and concentrated in vacuo. This gave 2-cyclopentylmethyl-3-[formyl-(tetrahydro-pyran-2-yloxy)-amino]-propionic acid (1.20 g, 50% yield) as an oil.

後処理

  1. customThe mixture is slowly quenched with 0.5 M Na2SO3
  2. temperaturewhile maintaining the temperature below 15° C. with an ice bath
  3. stirringThe quenched mixture is stirred for an addition 30 minutes
  4. concentrationconcentrated in vacuo until the THF solvent
  5. customis removed
  6. washwashed with EtOAc
  7. customThe basic reaction mixture
  8. extractionthe combined mixture is extracted with EtOAc
  9. washThe organic layers from the acidic solution washing
  10. dry with materialdried over Na2SO4
  11. concentrationconcentrated in vacuo

出典と根拠

ORDレコード
ord-361ed2e3cd464f2b965cf3ecda073652
出典データセット
uspto-grants-2009_11
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US07615635B2

反応ノート

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