Potassium Iodide → 3-Methoxy-4-(3-morpholinopropoxy)benzoic acid

HRID 1597209ノート

反応式

HRID 1597209 の反応式
[OH:1][C:2]1[CH:10]=[CH:9][C:5]([C:6]([OH:8])=[O:7])=[CH:4][C:3]=1[O:11][CH3:12].[O:13]1[CH2:18][CH2:17][N:16]([CH2:19][CH2:20][CH2:21]Cl)[CH2:15][CH2:14]1.C(=O)([O-])[O-].[K+].[K+].[I-].[K+]>CN(C=O)C>[CH3:12][O:11][C:3]1[CH:4]=[C:5]([CH:9]=[CH:10][C:2]=1[O:1][CH2:21][CH2:20][CH2:19][N:16]1[CH2:17][CH2:18][O:13][CH2:14][CH2:15]1)[C:6]([OH:8])=[O:7]

参加物

6

反応物 4

HCID 4875Potassium IodideHCID 8468Vanillic AcidHCID 11430Potassium CarbonateHCID 958344-(3-Chloropropyl)morpholine

生成物 1

HCID 216992843-Methoxy-4-(3-morpholinopropoxy)benzoic acid収率 109.3%

試薬・触媒・溶媒 1

HCID 6228Dimethylformamide溶媒

反応条件

温度
100 °C

実験手順

A mixture of 4-hydroxy-3-methoxybenzoic acid (4.5 g, 26.8 mmol), 3-morpholinopropyl chloride (9.5 g, 58.0 mmol), (prepared according to J. Am. Chem. Soc. 1945, 67, 736), potassium carbonate (8.0 g, 58 mmol), potassium iodide (1.0 g, 0.22 mmol) and DMF (80 ml) was stirred and heated at 100° C. for 3 hours. The solid was removed by filtration and the volatiles were removed from the filtrate by evaporation. The residue was dissolved in ethanol (50 ml), 2M sodium hydroxide (50 ml) was added and the mixture was heated at 90° C. for 2 hours. After partial evaporation, the mixture was acidified with concentrated hydrochloric acid, washed with ether and then subjected to purification on a Diaion (trade mark of Mitsubishi) HP20SS resin column, eluting with water and then with a gradient of methanol (0 to 25%) in hydrochloric acid (pH2). Partial evaporation of the solvents and lyophilisation gave 3-methoxy-4-(3-morpholinopropoxy)benzoic acid (8.65 g, 97%).

後処理

  1. customThe solid was removed by filtration
  2. customthe volatiles were removed from the filtrate by evaporation
  3. dissolutionThe residue was dissolved in ethanol (50 ml)
  4. addition2M sodium hydroxide (50 ml) was added
  5. temperaturethe mixture was heated at 90° C. for 2 hours
  6. customAfter partial evaporation
  7. washwashed with ether
  8. customsubjected to purification on a Diaion (trade mark of Mitsubishi) HP20SS resin column
  9. washeluting with water
  10. customPartial evaporation of the solvents and lyophilisation

出典と根拠

ORDレコード
ord-032e2f981db2462197ebc1997c469494
出典データセット
uspto-grants-2001_09
特許番号
US06294532B1

反応ノート

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