反応式
[N+]([C:4]1[C:13]2[C:8](=[C:9]([N+:14]([O-:16])=[O:15])[CH:10]=[CH:11][CH:12]=2)[CH:7]=[CH:6][CH:5]=1)([O-])=O.C1C2C(=CC=CC=2)C=CC=1.[N+:27]([O-])([OH:29])=[O:28].[N+](C1C2C(=CC=CC=2)C=CC=1)([O-])=O>>[N+:14]([C:9]1[C:8]2[C:13](=[CH:4][CH:5]=[CH:6][C:7]=2[N+:27]([O-:29])=[O:28])[CH:12]=[CH:11][CH:10]=1)([O-:16])=[O:15]参加物
5
実験手順
The process for the production of 1,5-dinitronaphthalene according to the invention is based on the direct nitration of naphthalene by nitric acid having a concentration of 72–87 wt.-% without mononitronaphthalene isolation. The washing of the reaction products with water and acetone leads to 1,5-dinitronaphthalene of high purity [≧98 wt.-%]. The acetone and nitric acid used in the process may be recovered and returned into the process. 1,8-dinitronaphthalene is produced in the process as a by-product.
後処理
- washThe washing of the reaction products with water and acetone leads to 1,5-dinitronaphthalene of high purity [≧98 wt.-%]
- custommay be recovered
出典と根拠
- ORDレコード
- ord-f34cb4e0405e4cfa9fba5729bb1e81cc
- 出典データセット
- uspto-grants-2006_01
- 特許番号
- US06992230B2
関連ノート
読み込み中…