Dimethyl Sulfoxide → (1S,3R)-3-(5'-chloro-6-(3-fluorobenzylamino)-2,4'-bipyridin-2'-yl-amino)cyclopentanecarbaldehyde
反応式
C(Cl)(=O)C(Cl)=O.CS(C)=O.[Cl:11][C:12]1[C:13]([C:26]2[CH:31]=[CH:30][CH:29]=[C:28]([NH:32][CH2:33][C:34]3[CH:39]=[CH:38][CH:37]=[C:36]([F:40])[CH:35]=3)[N:27]=2)=[CH:14][C:15]([NH:18][C@@H:19]2[CH2:23][CH2:22][C@H:21]([CH2:24][OH:25])[CH2:20]2)=[N:16][CH:17]=1>C(Cl)Cl.CCOC(C)=O>[Cl:11][C:12]1[C:13]([C:26]2[CH:31]=[CH:30][CH:29]=[C:28]([NH:32][CH2:33][C:34]3[CH:39]=[CH:38][CH:37]=[C:36]([F:40])[CH:35]=3)[N:27]=2)=[CH:14][C:15]([NH:18][C@@H:19]2[CH2:23][CH2:22][C@H:21]([CH:24]=[O:25])[CH2:20]2)=[N:16][CH:17]=1参加物
反応物 3
生成物 1
試薬・触媒・溶媒 2
反応条件
- 温度
- -78 °C
実験手順
In a flame-dried argon purged 20 mL conical flask, oxalyl chloride (0.025 ml, 0.281 mmol) was dissolved in DCM (0.5 ml) and cooled to −78° C. under argon. DMSO (0.030 ml, 0.422 mmol) was dissolved in DCM (0.5 ml) and added dropwise to the previous solution (I don't see issues here). This was stirred for 30 min at −78° C. ((1S,3R)-3-(5′-chloro-6-(3-fluorobenzylamino)-2,4′-bipyridin-2′-yl-amino)cyclopentyl)methanol (60 mg, 0.141 mmol) was dissolved in DCM (0.5 ml) and added dropwise to the reaction mixture. The resulting mixture was stirred for 60 min at −78° C. TEA (0.078 ml, 0.562 mmol) was dissolved in DCM (0.5 ml) and added dropwise to the reaction mixture, after which the reaction mixture was allowed to stir and warm to ambient temp over 2 hr. The reaction mixture was diluted with EtOAc, washed with saturated NH4Cl (30 mL×3), H2O (30 mL), brine (30 mL), dried over Na2SO4 and reduced. The resulting residue was used without further purification. LCMS (m/z): 425.2 (MH+), retention time=0.72.
後処理
- customIn a flame-dried argon purged 20 mL conical flask
- additionadded dropwise to the previous solution (I
- additionadded dropwise to the reaction mixture
- additionadded dropwise to the reaction mixture
- stirringto stir
- temperaturewarm to ambient temp over 2 hr
- washwashed with saturated NH4Cl (30 mL×3), H2O (30 mL), brine (30 mL)
- dry with materialdried over Na2SO4
- customThe resulting residue was used without further purification
出典と根拠
- ORDレコード
- ord-5a9ad26113df494bb8a30aa9558e557c
- 出典データセット
- uspto-grants-2014_07
- 特許番号
- US08778951B2
反応ノート
読み込み中…