Triethylsilane → HCID 9973488、化合物

HRID 1707327ノート

反応式

HRID 1707327 の反応式
[CH2:1]([NH:9][C:10](=[O:48])[C@H:11]([C@H:44]([CH2:46][CH3:47])[CH3:45])[NH:12][CH2:13][C@@H:14]([NH:36]C(OC(C)(C)C)=O)[CH2:15][S:16]C(C1C=CC=CC=1)(C1C=CC=CC=1)C1C=CC=CC=1)[CH2:2][C:3]1[CH:8]=[CH:7][CH:6]=[CH:5][CH:4]=1.C([SiH](CC)CC)C>FC(F)(F)C(O)=O.C(Cl)Cl>[CH2:1]([NH:9][C:10](=[O:48])[C@H:11]([C@H:44]([CH2:46][CH3:47])[CH3:45])[NH:12][CH2:13][C@@H:14]([NH2:36])[CH2:15][SH:16])[CH2:2][C:3]1[CH:8]=[CH:7][CH:6]=[CH:5][CH:4]=1

参加物

5

反応物 2

HCID 12052TriethylsilaneHCID 10055192HCID 10055192、化合物

生成物 1

HCID 9973488HCID 9973488、化合物収率 44.2%

試薬・触媒・溶媒 2

HCID 6344Dichloromethane溶媒HCID 6422Trifluoroacetic acid溶媒

実験手順

The product of Step D (0.09 g, 0.14 mmol) was dissolved in 4 mL of 25% trifluoroacetic acid (TFA) in CH2Cl2 at ambient temperature, triethylsilane (0.089 mL, 0.56 mmol) was added and the solution was stirred for 3 h. The reaction mixture was concentrated and partitioned between EtOAc and aqueous saturated NaHCO3 solution. The organic layer was washed with brine and dried (Na2SO4). Filtration, concentration and trituration with hexane provided 0.02 g (44%) of the title compound, mp 69°-73° C.

後処理

  1. concentrationThe reaction mixture was concentrated
  2. custompartitioned between EtOAc and aqueous saturated NaHCO3 solution
  3. washThe organic layer was washed with brine
  4. dry with materialdried (Na2SO4)
  5. filtrationFiltration, concentration and trituration with hexane

出典と根拠

ORDレコード
ord-bd09be1ffd1a47eba1795ac91e3524b6
出典データセット
uspto-grants-1994_10
特許番号
US05352705

反応ノート

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