反応式
[B-](F)(F)(F)F.CCOC(C(C#N)=NOC(N(C)C)=[N+](C)C)=O.C(N(CC)C(C)C)(C)C.[F:32][C:33]([F:74])([F:73])[C:34]1([C:69]([F:72])([F:71])[F:70])[C:38](=[O:39])[N:37]([C@@H:40]([CH2:44][CH:45]([CH3:47])[CH3:46])[C:41](O)=[O:42])[C:36](=[O:48])[N:35]1[CH2:49][C:50]1[CH:55]=[CH:54][C:53]([NH:56][C:57]([NH:59][C:60]2[CH:65]=[CH:64][CH:63]=[CH:62][C:61]=2[CH3:66])=[O:58])=[C:52]([O:67][CH3:68])[CH:51]=1.[NH2:75][C@H:76]([C:83]1[CH:88]=[CH:87][CH:86]=[CH:85][CH:84]=1)[CH2:77][C:78]([O:80][CH2:81][CH3:82])=[O:79]>CN(C=O)C>[F:72][C:69]([F:70])([F:71])[C:34]1([C:33]([F:74])([F:73])[F:32])[C:38](=[O:39])[N:37]([C@@H:40]([CH2:44][CH:45]([CH3:46])[CH3:47])[C:41]([NH:75][C@H:76]([C:83]2[CH:88]=[CH:87][CH:86]=[CH:85][CH:84]=2)[CH2:77][C:78]([O:80][CH2:81][CH3:82])=[O:79])=[O:42])[C:36](=[O:48])[N:35]1[CH2:49][C:50]1[CH:55]=[CH:54][C:53]([NH:56][C:57]([NH:59][C:60]2[CH:65]=[CH:64][CH:63]=[CH:62][C:61]=2[CH3:66])=[O:58])=[C:52]([O:67][CH3:68])[CH:51]=1参加物
反応物 4
生成物 1
試薬・触媒・溶媒 1
実験手順
1.89 g (5.77 mmol) of TOTU and 932 μL of N,N-diisopropylethylamine were added at 0° C. to a solution of 3.57 g (5.77 mmol) of (S)-2-(4,4-bis(trifluoromethyl)-3-(4-(3-(2-methylphenyl)ureido)-3-methoxybenzyl)-2, 5-dioxoimidazolidin-1-yl)-2-(2-methylpropyl)acetic acid (prepared from (S)-2-(4,4-bis(trifluoromethyl)-2,5-dioxoimidazolidin-1-yl)-2-(2-methylpropyl)acetic acid and 4-(3-(2-methylphenyl)ureido)-3-methoxybenzyl chloride as described in Example 18f) and 1.11 g (5.77 mmol) of ethyl (S)-3-amino-3-phenylpropionate in 30 mL of absolute DMF. After stirring at room temperature for 1 hour, DMF was removed in vacuo, the residue was taken up in ethyl acetate and the ethyl acetate solution was washed successively with an aqueous KHSO4K2SO4 solution, a saturated NaHCO3 solution and water. After drying the organic phase over sodium sulfate and filtering, the solvent was removed in vacuo and the residue was chromatographed over silica gel using ethyl acetate/heptane (2/3). After concentration of the product fractions, 3.26 g (71%) of the title compound were obtained.
後処理
- customDMF was removed in vacuo
- washthe ethyl acetate solution was washed successively with an aqueous KHSO4K2SO4 solution
- dry with materialAfter drying the organic phase over sodium sulfate
- filtrationfiltering
- customthe solvent was removed in vacuo
- customthe residue was chromatographed over silica gel
出典と根拠
- ORDレコード
- ord-9df09ac466a34b57b17d0a07ae4c3dd5
- 出典データセット
- uspto-grants-2004_01
- 特許番号
- US06680333B2
関連ノート
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