反応式
C(N(C(C)C)CC)(C)C.[C@@H:10]1([C:16]([OH:18])=O)[CH2:12][C@@H:11]1[C:13]([OH:15])=[O:14].[CH3:19][NH:20][CH2:21][CH2:22][CH3:23].F[P-](F)(F)(F)(F)F.N1(OC(N(C)C)=[N+](C)C)C2C=CC=CC=2N=N1.C1C=CC2N(O)N=NC=2C=1>CN(C)C=O.ClCCl>[CH3:19][N:20]([CH2:21][CH2:22][CH3:23])[C:16]([C@H:10]1[CH2:12][C@H:11]1[C:13]([OH:15])=[O:14])=[O:18]参加物
反応物 5
生成物 1
試薬・触媒・溶媒 2
実験手順
Add diisopropylethylamine (2.68 mL, 15.4 mmol) and cis-cyclopropane-1,2-dicarboxylic acid (0.50 g, 3.84 mmol) to a slurry of 2-chlorotrityl chloro resin (3.00 g, Nova Bio) in 7:1 dichloromethane:dimethylfomamide (10.0 mL). Stir over night and then filter the slurry. Wash the resin with 17:2:1 dichloromethane:methanol:dimethylformamide (3×20 mL) followed by dichloromethane (3×20 mL). Add the filtered resin to a solution of diisopropylethylamine (1.34 mL, 7.69 mmol), methylpropylamine (0.788 mL, 7.69 mmol), O-benzotriazol-1-yl-N,N,N′,N′-tetramethyluronium hexafluorophosphate (HBTU) (2.915 g, 7.69 mmol), and HOBT (1.177 g, 7.69 mmol) in dimethylformamide (10 mL) and shake for 2.5 days. Filter and wash the resin with dimethylformamide (3×20 mL) and dichloromethane (5×20 mL). Add trifluoroacetic acid (1 mL) to a slurry of the washed resin in dichloromethane (20 mL). Shake for 45 minutes and filter. Wash the resin with dichloromethane (2×20 mL) and concentrate this filtrate under reduced pressure. Subject the residue to silica gel chromatography, eluting with dichloromethane containing 10-40% of 5% (2:1 methanol:acetic acid) in dichloromethane to provide the title compound (0.247 g, 34.7%).
後処理
- filtrationfilter the slurry
- washWash the resin with 17:2:1 dichloromethane
- filtrationFilter
- washwash the resin with dimethylformamide (3×20 mL) and dichloromethane (5×20 mL)
- waitShake for 45 minutes
- filtrationfilter
- washWash the resin with dichloromethane (2×20 mL)
- concentrationconcentrate this filtrate under reduced pressure
- washeluting with dichloromethane containing 10-40% of 5% (2:1 methanol:acetic acid) in dichloromethane
出典と根拠
- ORDレコード
- ord-4dbbcced1455457f8f1babd92053b35f
- 出典データセット
- uspto-grants-2010_06
- 特許番号
- US07745438B2
関連ノート
読み込み中…