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Hydrochloric Acid → HCID 14281435、化合物

HRID 2231886
ノート
印刷プレビュー

反応式

HRID 2231886 の反応式
C([Li])CCC.[Si:6]([O:13][CH:14]([C:44]1[N:45]=[CH:46][O:47][CH:48]=1)[CH2:15][CH:16]([O:36][Si:37]([C:40]([CH3:43])([CH3:42])[CH3:41])([CH3:39])[CH3:38])[CH:17]([O:28][Si:29]([C:32]([CH3:35])([CH3:34])[CH3:33])([CH3:31])[CH3:30])[CH:18]([O:20][Si:21]([C:24]([CH3:27])([CH3:26])[CH3:25])([CH3:23])[CH3:22])[CH3:19])([C:9]([CH3:12])([CH3:11])[CH3:10])([CH3:8])[CH3:7].[CH:49]([C:51]1[O:55][CH:54]=[N:53][CH:52]=1)=[O:50].Cl>CCCCCC.C1COCC1.O>[O:55]1[C:51]([CH:49]([C:46]2[O:47][CH:48]=[C:44]([CH:14]([O:13][Si:6]([C:9]([CH3:10])([CH3:11])[CH3:12])([CH3:7])[CH3:8])[CH2:15][CH:16]([O:36][Si:37]([C:40]([CH3:43])([CH3:42])[CH3:41])([CH3:38])[CH3:39])[CH:17]([O:28][Si:29]([C:32]([CH3:33])([CH3:34])[CH3:35])([CH3:31])[CH3:30])[CH:18]([O:20][Si:21]([C:24]([CH3:26])([CH3:25])[CH3:27])([CH3:23])[CH3:22])[CH3:19])[N:45]=2)[OH:50])=[CH:52][N:53]=[CH:54]1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

8

反応物 4

HCID 313Hydrochloric AcidHCID 118293725-OXAZOLECARBOXALDEHYDEHCID 14281434HCID 14281434、化合物HCID 178418339Butyllithium

生成物 1

HCID 14281435HCID 14281435、化合物

試薬・触媒・溶媒 3

HCID 962Water溶媒
HCID 8028
Tetrahydrofuran
溶媒
2 回
HCID 8058Hexane溶媒

反応条件

温度
-50 °C

実験手順

Butyllithium (n-Buli, 0.32 g, 5 mmol) in hexane is added to a -50° C. Solution of 4-[1,3,4,5-tetra(t-butyldimethylsilyloxy)hexyl]oxazole (6, 3.4 g, 5 mmol) in THF (50 mL). The resulting solution stirred at -50° C. for three hours. A solution of 5-formyloxazole (0.53 g, 5.5 mmol - Preparation 20) in THF (7 mL) is added, and the mixture allowed to warm to room temperature while stirring for 12 hours. The resulting mixture is added to water, acidified with HCl and extracted three times with ether. The organic layer is washed with aqueous Na2SO3 and brine, dried over Na2SO4, and evaporated to yield 2-[1-(oxazol-5-yl)-1-hydroxymethyl]-4-[1,3,4,5-tetra(t-butyldimethylsilyloxy)hexyl]oxazole (7).

後処理

  1. temperatureto warm to room temperature
  2. stirringwhile stirring for 12 hours
  3. extractionextracted three times with ether
  4. washThe organic layer is washed with aqueous Na2SO3 and brine
  5. dry with materialdried over Na2SO4
  6. customevaporated

出典と根拠

ORDレコード
ord-3fdd377b95fb4605b79b837648809c90
出典データセット
uspto-grants-1988_11
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US04785012

反応ノート

読み込み中…

このページの内容参加物反応条件実験手順後処理出典と根拠反応ノート