HCID 849409、化合物 → HCID 59643067、化合物
反応式
C([O:3][C:4]([C:6]1[C:7]([NH:14][C:15]2[N:16]([CH3:21])[N:17]=[C:18]([CH3:20])[CH:19]=2)=[N:8][C:9]([S:12][CH3:13])=[N:10][CH:11]=1)=O)C.[H-].[Al+3].[Li+].[H-].[H-].[H-]>C1COCC1>[CH3:21][N:16]1[C:15]([NH:14][C:7]2[C:6]([CH2:4][OH:3])=[CH:11][N:10]=[C:9]([S:12][CH3:13])[N:8]=2)=[CH:19][C:18]([CH3:20])=[N:17]1参加物
反応条件
- 温度
- 0 °C
実験手順
To a cold (0° C.) solution of 4-(2,5-dimethyl-2H-pyrazol-3-ylamino)-2-methylsulfanyl-pyrimidine-5-carboxylic acid ethyl ester, 16, (2.0 g, 6.5 mmol) in THF (30 mL) is added dropwise lithium aluminum hydride (10.4 mL of IM solution in THF, 10.4 mmol). The reaction is stirred at 0° C. for 5 minutes, then the ice bath is removed and the mixture allowed to stir for 45 minutes at room temperature. The reaction is re-cooled to 0° C., and H2O (0.4 mL) added dropwise to the mixture. After stirring 10 min at 0° C., NaOH solution (0.4 mL of 2N solution) is added dropwise. After stirring an additional 10 min at 0° C., H2O (1.2 mL) is added to the mixture, and the mixture stirred at room temperature for 15 minutes. The resulting mixture dried (MgSO4), filtered and concentrated in vacuo. The resulting residue is purified over silica (5% MeOH//chloroform) to afford 1.0 g of the desired product: 1H NMR (300 MHz, CDCl3) δ 8.22 (s, NH), 7.89 (s, 1H), 6.22 (s, 1H), 4.72 (s, 2H), 3.68 (s, 3H), 2.47 (s, 3H), 2.26 (s, 3H); ESI+ MS: m/z (rel intensity) 266.0 (100, M++H).
後処理
- customthe ice bath is removed
- stirringto stir for 45 minutes at room temperature
- temperatureThe reaction is re-cooled to 0° C.
- additionH2O (0.4 mL) added dropwise to the mixture
- stirringAfter stirring 10 min at 0° C.
- additionNaOH solution (0.4 mL of 2N solution) is added dropwise
- stirringAfter stirring an additional 10 min at 0° C.
- additionH2O (1.2 mL) is added to the mixture
- stirringthe mixture stirred at room temperature for 15 minutes
- dry with materialThe resulting mixture dried (MgSO4)
- filtrationfiltered
- concentrationconcentrated in vacuo
- customThe resulting residue is purified over silica (5% MeOH//chloroform)
出典と根拠
- ORDレコード
- ord-a1a28bac626147868b12d861f40b94d2
- 出典データセット
- uspto-grants-2008_01
- 特許番号
- US07319102B1
反応ノート
読み込み中…