Diethyl Ether → (R)-tert-butyl 2-(3-fluoro-4-(trifluoromethyl)benzoyl)-pyrrolidine-1-carboxylate

HRID 2279456ノート

反応式

HRID 2279456 の反応式
Br[C:2]1[CH:7]=[CH:6][C:5]([C:8]([F:11])([F:10])[F:9])=[C:4]([F:12])[CH:3]=1.CCOCC.C([Li])CCC.CON(C)[C:26]([C@H:28]1[CH2:32][CH2:31][CH2:30][N:29]1[C:33]([O:35][C:36]([CH3:39])([CH3:38])[CH3:37])=[O:34])=[O:27]>C1COCC1>[F:12][C:4]1[CH:3]=[C:2]([CH:7]=[CH:6][C:5]=1[C:8]([F:11])([F:10])[F:9])[C:26]([C@H:28]1[CH2:32][CH2:31][CH2:30][N:29]1[C:33]([O:35][C:36]([CH3:39])([CH3:38])[CH3:37])=[O:34])=[O:27]

参加物

6

反応条件

温度
-78 °C

実験手順

To a solution of 4-bromo-2-fluoro-1-(trifluoromethyl)benzene (4.854 g, 19.98 mmol) and ether (50 mL) cooled to −78° C. was added butyl lithium (7.990 mL, 19.98 mmol) slowly over 10 min. The reaction was transferred via cannula to a solution of 74 (4.30 g, 16.65 mmol) in THF (50 mL) cooled to −78° C. The reaction was stirred for 10 min after all aryl lithium was added. The reaction was quenched with water and extracted with DCM. The organic layer was concentrated and the crude product purified by SiO2 chromatography eluting with an EtOAc/hexane (1 to 5% EtOAc). A close running impurity was not removed by this purification. A SiO2 column was run eluting with an Et2O/hexane gradient (1 to 3% Et2O). The impurity was still present and the compound was finally purified on a SP4 reverse phase column chromatography eluting with MeCN/water gradient (65 to 100% MeCN) to afford 2.105 g (33.2%) of (R)-tert-butyl 2-(3-fluoro-4-(trifluoromethyl)benzoyl)-pyrrolidine-1-carboxylate (76).

後処理

  1. additionwas added
  2. customThe reaction was quenched with water
  3. extractionextracted with DCM
  4. concentrationThe organic layer was concentrated
  5. customthe crude product purified by SiO2 chromatography
  6. washeluting with an EtOAc/hexane (1 to 5% EtOAc)
  7. customwas not removed by this purification
  8. washA SiO2 column was run eluting with an Et2O/hexane gradient (1 to 3% Et2O)
  9. customthe compound was finally purified on a SP4 reverse phase column chromatography
  10. washeluting with MeCN/water gradient (65 to 100% MeCN)

出典と根拠

ORDレコード
ord-f5cb3ac9e2e14bca916f55fa7f956b94
出典データセット
uspto-grants-2015_09
特許番号
US09133187B2

反応ノート

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