Acetic Acid → 4-((Tert-butyldimethylsilyl)oxy)-4-methylpent-2-ynal
反応式
[CH3:1][C:2]([Si:5]([O:8][C:9]([CH3:13])([CH3:12])[C:10]#[CH:11])([CH3:7])[CH3:6])([CH3:4])[CH3:3].C([Li])CCC.CN(C)[CH:21]=[O:22].C(O)(=O)C>O1CCCC1.O.CCCCCC>[CH3:4][C:2]([Si:5]([CH3:6])([CH3:7])[O:8][C:9]([CH3:13])([CH3:12])[C:10]#[C:11][CH:21]=[O:22])([CH3:1])[CH3:3]参加物
反応物 4
生成物 1
試薬・触媒・溶媒 3
反応条件
- 温度
- -20 °C
実験手順
To a solution of 50.0 g (252 mmol) (1,1-dimethylethyl)[(1,1-dimethyl-2-propynyl)oxy]dimethylsilane in 200 mL of tetrahydrofuran (THF) at -70° C. was added 112 mL (280 mmol) of 2.5M butyl lithium (BuLi) in hexanes dropwise over 25 min., keeping the temperature below -55° C. The mixture was stirred for 5 minutes. Then, 50 mL of dimethylformamide (DMF) was added dropwise over 10 minutes. After 15 minutes, the reaction was quenched by the addition of 32 mL of acetic acid (560 mmol). After the mixture was allowed to warm to -20° C., 200 mL of hexane and 200 mL of water were added. The aqueous layer was back-extracted with 100 mL of hexane. The combined organic layers were washed with 200 mL of saturated aqueous NH4Cl solution and then with 200 mL of brine. After drying over sodium sulfate, the solution was concentrated to dryness. Then the residue was distilled through a 10-cm Vigreaux column to give 48.8 g (85.5% yield) of 4-[[(1,1-dimethylethyl)dimethylsilyl]oxy]-4-methyl-2-pentynal: bp 50° C. (0.5 mm Hg).
後処理
- customthe temperature below -55° C
- waitAfter 15 minutes
- extractionThe aqueous layer was back-extracted with 100 mL of hexane
- washThe combined organic layers were washed with 200 mL of saturated aqueous NH4Cl solution
- dry with materialAfter drying over sodium sulfate
- concentrationthe solution was concentrated to dryness
- distillationThen the residue was distilled through a 10-cm Vigreaux column
出典と根拠
- ORDレコード
- ord-669a2039c47c48b286fc42fd6ee4f6a7
- 出典データセット
- uspto-grants-1995_02
- 特許番号
- US05393900
反応ノート
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