反応式
[CH3:1][C:2]([C:5]1[CH:6]=[C:7]([CH:16]=[C:17]2[S:21][C:20](=S)[N:19]([CH3:23])[C:18]2=[O:24])[CH:8]=[C:9]([C:12]([CH3:15])([CH3:14])[CH3:13])[C:10]=1[OH:11])([CH3:4])[CH3:3].C([SnH](CCCC)CCCC)CCC.N(C(C)(C)C#N)=NC(C)(C)C#N.O>C1(C)C=CC=CC=1>[CH3:4][C:2]([C:5]1[CH:6]=[C:7]([CH:16]=[C:17]2[S:21][CH2:20][N:19]([CH3:23])[C:18]2=[O:24])[CH:8]=[C:9]([C:12]([CH3:13])([CH3:14])[CH3:15])[C:10]=1[OH:11])([CH3:1])[CH3:3]参加物
6
反応物 4
生成物 1
試薬・触媒・溶媒 1
実験手順
The title compound was prepared in 71% yield from 10.31 g of the thione of Example 9 upon heating with 38.15 ml of tri-n-butyl tin hydride and 1.16 g of azobisisobutyronitrile (AIBN) in 142 ml of toluene at reflux temperature for one hour. The product was isolated by adding water to the cooled reaction mixture, separating the layers, washing the organic layer with 1N hydrochloric acid and a saturated sodium chloride solution, drying over magnesium sulfate, concentrating in vacuo, and purifying the residue by chromatography over silica gel eluting with a 10-50% hexane in ethyl acetate gradient. The purified product had a melting point of 142°-144° C.
後処理
- temperatureat reflux temperature for one hour
- customThe product was isolated
- customto the cooled reaction mixture
- customseparating the layers
- washwashing the organic layer with 1N hydrochloric acid
- dry with materiala saturated sodium chloride solution, drying over magnesium sulfate
- concentrationconcentrating in vacuo
- custompurifying the residue by chromatography over silica gel eluting with a 10-50% hexane in ethyl acetate gradient
出典と根拠
- ORDレコード
- ord-867855b5cbc343afbf6e7d8206f20441
- 出典データセット
- uspto-grants-1998_03
- 特許番号
- US05731336
関連ノート
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