反応式
ClS(N=C=O)(=O)=O.C(O)=O.[Si]([O:18][C@H:19]1[CH2:24][CH2:23][C@H:22]2[C@H:25]3[C@H:34]([CH2:35][CH2:36][C@:20]12[CH3:21])[C:33]1[CH:32]=[C:31]([CH:37]=[O:38])[C:30]([OH:39])=[CH:29][C:28]=1[CH2:27][CH2:26]3)(C(C)(C)C)(C)C.[H-].[Na+]>C(Cl)Cl.CN(C=O)C>[OH:39][C:30]1[C:31]([CH:37]=[O:38])=[CH:32][C:33]2[C@@H:34]3[C@H:25]([C@H:22]4[C@@:20]([CH2:36][CH2:35]3)([CH3:21])[C@@H:19]([OH:18])[CH2:24][CH2:23]4)[CH2:26][CH2:27][C:28]=2[CH:29]=1参加物
実験手順
To a solution of chlorosulfonyl isocyanate (0.13 mL, 1.5 mmol) in CH2Cl2 (1.0 mL) was added formic acid (0.31 mL of a CH2Cl2 solution, 5.0M, 1.6 mmol) at 0° C. The reaction mixture was warmed to room temperature and stirred for 1 h. To a solution of 17β-tert-butyldimethylsilyloxy-3-hydroxyestra-1,3,5(10)-triene-2-carbox aldehyde (9, 0.129 g, 0.31 mmol) in DMF (3.0 mL) was added sodium hydride (0.044 g of a mineral oil dispersion, 60%, 1.1 mmol) at 0° C. The reaction mixture was stirred for 1 h, the pre-prepared reagent was added, and stirring continued for 4 h at room temperature. The reaction mixture was quenched with saturated aqueous NH4Cl at 0° C. and extracted with EtOAc. The combined organic layers were washed with H2O, then with saturated aqueous NaCl, and dried (MgSO4). The desiccant was filtered and the solvent was evaporated at reduced pressure. The residue was purified by column chromatography (silica gel) using n-hexane:acetone (2:1→1:1, v/v) to afford 0.017 g of 2a (18% yield) and 0.030 g of 10 (27% yield), m.p. 170°-172° C.
後処理
- stirringThe reaction mixture was stirred for 1 h
- additionthe pre-prepared reagent was added
- stirringstirring
- waitcontinued for 4 h at room temperature
- customThe reaction mixture was quenched with saturated aqueous NH4Cl at 0° C.
- extractionextracted with EtOAc
- washThe combined organic layers were washed with H2O
- dry with materialwith saturated aqueous NaCl, and dried (MgSO4)
- filtrationThe desiccant was filtered
- customthe solvent was evaporated at reduced pressure
- customThe residue was purified by column chromatography (silica gel)
出典と根拠
- ORDレコード
- ord-3cf41a3f2a0c453982aa15a49fad71b4
- 出典データセット
- uspto-grants-1999_01
- 特許番号
- US05861388
関連ノート
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