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2-Chlorophenylboronic acid → 5-(2-Chlorophenyl)-4-cyano-3-nitroanisole

HRID 353042
ノート
印刷プレビュー

反応式

HRID 353042 の反応式
Br[C:2]1[C:3]([C:13]#[N:14])=[C:4]([N+:10]([O-:12])=[O:11])[CH:5]=[C:6]([O:8][CH3:9])[CH:7]=1.[Cl:15][C:16]1[CH:21]=[CH:20][CH:19]=[CH:18][C:17]=1B(O)O>C1(C)C=CC=CC=1.CCO.C(=O)([O-])[O-].[Na+].[Na+].C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[Cl:15][C:16]1[CH:21]=[CH:20][CH:19]=[CH:18][C:17]=1[C:2]1[C:3]([C:13]#[N:14])=[C:4]([N+:10]([O-:12])=[O:11])[CH:5]=[C:6]([O:8][CH3:9])[CH:7]=1
参加物実験手順後処理出典と根拠反応ノート

参加物

7

反応物 2

HCID 27343222-Chlorophenylboronic acidHCID 227070275-Bromo-4-cyano-3-nitroanisole

生成物 1

HCID 227070565-(2-Chlorophenyl)-4-cyano-3-nitroanisole収率 100%

試薬・触媒・溶媒 4

HCID 178418397HCID 178418397、化合物触媒HCID 702Ethanol溶媒
HCID 1140
Toluene
溶媒
HCID 10340Sodium Carbonate溶媒

実験手順

5-Bromo-4-cyano-3-nitroanisole [prepared by the method of Harrison et al, J. Chem. Soc. C, 1769 (1966)] (250 mg, 0.86 mmol) and 2-chlorophenylboronic acid (150 mg, 0.96 mmol) were dissolved in a mixture of toluene (10 ml), EtOH (5.6 ml), and 1N aqueous sodium carbonate (1.7 ml). The solution was placed under a nitrogen atmosphere and tetrakis(triphenylphosphine)palladium (30 mg, 0.03 mmol) added. After refluxing for 3 h, the solvent was removed from the reaction mixture under reduced pressure. The residue was partitioned between H2O (50 ml) and EtOAc (50 ml) and the EtOAc layer washed with H2O (2×50 ml), and dried over MgSO4. Following removal of the solvent, the crude material was purified on silica gel, eluting with hexane/ether (1/1, v/v). This gave the subtitle compound as a colourless gum (252 mg, 100%). Rf 0.38 (hexane/ether 1:1, v/v). MS m/z 306 and 308 (MNH4+).

後処理

  1. temperatureAfter refluxing for 3 h
  2. customthe solvent was removed from the reaction mixture under reduced pressure
  3. customThe residue was partitioned between H2O (50 ml) and EtOAc (50 ml)
  4. washthe EtOAc layer washed with H2O (2×50 ml)
  5. dry with materialdried over MgSO4
  6. customremoval of the solvent
  7. customthe crude material was purified on silica gel
  8. washeluting with hexane/ether (1/1

出典と根拠

ORDレコード
ord-3f317aa58e3b4b10a40dc6de244f7d94
出典データセット
uspto-grants-2004_06
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US06750214B2

反応ノート

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