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Water → 3,4-Dimethoxybicyclo[4.2.0]octa-1,3,5-triene-7-carbonitrile

HRID 420867
ノート
印刷プレビュー

反応式

HRID 420867 の反応式
C(NC(C)C)(C)C.C([Li])CCC.CN(C)S(=O)(=O)O[C:17]1[CH:22]=[C:21]([O:23][CH3:24])[C:20]([O:25][CH3:26])=[CH:19][C:18]=1[CH2:27][CH2:28][C:29]#[N:30].O>CCCCCC.C1COCC1>[CH3:26][O:25][C:20]1[CH:19]=[C:18]2[C:17](=[CH:22][C:21]=1[O:23][CH3:24])[CH:28]([C:29]#[N:30])[CH2:27]2
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

7

反応物 4

HCID 962WaterHCID 7912DiisopropylamineHCID 666574992-(2-Cyanoethyl)-4,5-dimethoxyphenyl dimethylsulphamateHCID 178418339Butyllithium

生成物 1

HCID 2905443,4-Dimethoxybicyclo[4.2.0]octa-1,3,5-triene-7-carbonitrile収率 110.8%

試薬・触媒・溶媒 2

HCID 8028
Tetrahydrofuran
溶媒
2 回
HCID 8058Hexane溶媒

反応条件

温度
-50 °C

実験手順

Under nitrogen, mix together 5.4 ml (0.0382 mol) of redistilled diisopropylamine and 60 ml of THF. Cool the mixture to −50° C. and pour in dropwise 15.3 ml (0.0382 mol) of a 2.5N solution of butyllithium in hexane. Allow the temperature to rise again to −5° C. and stir for 10 minutes. Cool the solution to −60° C. and pour in dropwise a solution of 3 g (0.00954 mol) of 2-(2-cyanoethyl)-4,5-dimethoxyphenyl dimethylsulphamate in 35 ml of THF. Allow the temperature slowly to rise again to −24° C. while monitoring by HPLC disappearance of the reactant. Add the reaction mixture to a mixture of water and ice and extract with ethyl acetate. Wash the organic phases in succession with 1N sodium hydroxide solution, aqueous 1N HCl solution, water and saturated aqueous NaCl solution and then dry them over MgSO4, filter, and evaporate off the solvents. 2 g of residue are obtained which is purified by flash chromatography on 70 g of silica (eluant=dichloromethane) to yield 0.9 g of title product in the form of a white solid.

後処理

  1. customto rise again to −5° C.
  2. temperatureCool the solution to −60° C.
  3. customto rise again to −24° C. while monitoring by HPLC disappearance of the reactant
  4. additionAdd the reaction mixture
  5. extractionextract with ethyl acetate
  6. washWash the organic phases in succession with 1N sodium hydroxide solution, aqueous 1N HCl solution, water and saturated aqueous NaCl solution
  7. dry with materialdry them over MgSO4
  8. filtrationfilter
  9. customevaporate off the solvents

出典と根拠

ORDレコード
ord-8df38abecf3448278950b0a677c5e602
出典データセット
uspto-grants-2012_01
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08097720B2

反応ノート

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