Trifluoroacetic acid → 1-Oxa-4,9-diazaspiro[5,5]undecan-4-yl(2-(trifluoromethyl)thiazol-4-yl)methanone trifluoroacetate
反応式
Cl.[O:2]1[C:7]2([CH2:12][CH2:11][N:10](C(OC(C)(C)C)=O)[CH2:9][CH2:8]2)[CH2:6][NH:5][CH2:4][CH2:3]1.[F:20][C:21]([F:31])([F:30])[C:22]1[S:23][CH:24]=[C:25]([C:27](O)=[O:28])[N:26]=1.CN(C(ON1N=NC2C=CC=NC1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.[F:56][C:57]([F:62])([F:61])[C:58]([OH:60])=[O:59]>CN(C=O)C.ClCCl.C1(C)C=CC=CC=1.C(N(CC)CC)C>[F:56][C:57]([F:62])([F:61])[C:58]([OH:60])=[O:59].[O:2]1[C:7]2([CH2:8][CH2:9][NH:10][CH2:11][CH2:12]2)[CH2:6][N:5]([C:27]([C:25]2[N:26]=[C:22]([C:21]([F:31])([F:20])[F:30])[S:23][CH:24]=2)=[O:28])[CH2:4][CH2:3]1参加物
反応物 4
生成物 1
試薬・触媒・溶媒 4
反応条件
- 温度
- 0 °C
実験手順
A solution of tert-butyl 1-oxa-4,9-diazaspiro[5.5]undecane-9-carboxylate hydrochloride (WuXi PharmaTech) (0.594 g) and 2-(trifluoromethyl)thiazole-4-carboxylic acid (0.4 g) in DMF (10 mL) was treated with triethylamine (0.848 mL) and cooled to 0° C. HATU (1.003 g) was added and the mixture stirred at 20° C. for 2 hours. The mixture was partitioned between ethyl acetate and brine, the organic layer was washed twice with brine, dried over sodium sulphate, filtered and the solvent evaporated under reduced pressure. The crude product was purified by flash silica chromatography eluting with 40% ethyl acetate in isohexane to yield the product as the free base. This was dissolved in dichloromethane (40 mL) and treated with trifluoroacetic acid (10 mL) and then the mixture was allowed to stand at 20° C. for 1 hour. Toluene (60 mL) was added and the solvent removed under reduced pressure to afford the subtitled compound. Yield 0.740 g.
後処理
- customThe mixture was partitioned between ethyl acetate and brine
- washthe organic layer was washed twice with brine
- dry with materialdried over sodium sulphate
- filtrationfiltered
- customthe solvent evaporated under reduced pressure
- customThe crude product was purified by flash silica chromatography
- washeluting with 40% ethyl acetate in isohexane
- customto yield the product as the free base
- waitto stand at 20° C. for 1 hour
- customthe solvent removed under reduced pressure
出典と根拠
- ORDレコード
- ord-31ae822026264ea3a9333456986c7e23
- 出典データセット
- uspto-grants-2014_01
- 特許番号
- US08629271B2
反応ノート
読み込み中…