Hydrochloric Acid → HCID 131728822、化合物

HRID 546679ノート

反応式

HRID 546679 の反応式
[CH2:1]([Li])[CH2:2][CH2:3][CH3:4].[F:6][C:7]1[CH:12]=[CH:11][C:10]([CH2:13][C:14]([OH:16])=[O:15])=[CH:9][CH:8]=1.C1(C)C=CC(S(OC(C)CC[O:30][Si:31]([C:44]([CH3:47])([CH3:46])[CH3:45])([C:38]2[CH:43]=[CH:42][CH:41]=[CH:40][CH:39]=2)[C:32]2[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=2)(=O)=O)=CC=1.Cl>C1COCC1.C(OCC)(=O)C>[Si:31]([O:30][C:13]([C:10]1[CH:9]=[CH:8][C:7]([F:6])=[CH:12][CH:11]=1)([CH:2]([CH3:1])[CH2:3][CH3:4])[C:14]([OH:16])=[O:15])([C:44]([CH3:46])([CH3:45])[CH3:47])([C:38]1[CH:39]=[CH:40][CH:41]=[CH:42][CH:43]=1)[C:32]1[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=1

参加物

7

反応物 4

HCID 313Hydrochloric AcidHCID 98372-(4-Fluorophenyl)acetic acidHCID 86628506HCID 86628506、化合物HCID 178418339Butyllithium

生成物 1

HCID 131728822HCID 131728822、化合物

試薬・触媒・溶媒 2

HCID 8028Tetrahydrofuran溶媒2 回HCID 8857Ethyl Acetate溶媒

反応条件

温度
0 °C

実験手順

n-Butyl lithium (4.89 mL; 2.66 M solution in hexane) was added dropwise to a solution of 4-fluorophenylacetic acid (1 g) in THF (30 mL) at −78° C., and the reaction solution was stirred for 20 minutes. The reaction solution was heated to 0° C. and stirred for 30 minutes. Then, a solution of 3-(tert-butyldiphenylsilanyloxy)-1-methylpropyl toluene-4-sulfonate (3.2 g) in THF (10 mL) was added dropwise to the reaction solution. The reaction solution was heated to room temperature and stirred at the same temperature for 12 hours. Then, 1 N hydrochloric acid and ethyl acetate were added to the reaction solution, and the organic layer was separated. The resulting organic layer was washed with brine, dried over anhydrous magnesium sulfate and then concentrated under reduced pressure. The residue was purified by silica gel column chromatography (elution solvent: heptane-ethyl acetate system) to obtain 986 mg of the title compound. The property values of the compound are as follows.

後処理

  1. stirringstirred for 30 minutes
  2. temperatureThe reaction solution was heated to room temperature
  3. stirringstirred at the same temperature for 12 hours
  4. customthe organic layer was separated
  5. washThe resulting organic layer was washed with brine
  6. dry with materialdried over anhydrous magnesium sulfate
  7. concentrationconcentrated under reduced pressure
  8. customThe residue was purified by silica gel column chromatography (elution solvent: heptane-ethyl acetate system)

出典と根拠

ORDレコード
ord-ee6d14383f4445c6925f4ee3f1c97bc9
出典データセット
uspto-grants-2011_05
特許番号
US07935815B2

反応ノート

読み込み中…