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Ammonium Chloride → HCID 44596871、化合物

HRID 553556
ノート
印刷プレビュー

反応式

HRID 553556 の反応式
[C:1]([N:9]1[C@H:13]([CH3:14])[C:12](=[O:15])[O:11][C@H:10]1[C:16]1[CH:21]=[CH:20][CH:19]=[CH:18][CH:17]=1)(=[O:8])[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.[Li+].C[Si]([N-][Si](C)(C)C)(C)C.[CH3:32][O:33][C:34]1[CH:41]=[CH:40][C:37]([CH2:38]Br)=[CH:36][CH:35]=1.[NH4+].[Cl-]>C1COCC1>[CH3:32][O:33][C:34]1[CH:41]=[CH:40][C:37]([CH2:38][C@:13]2([CH3:14])[C:12](=[O:15])[O:11][C@@H:10]([C:16]3[CH:17]=[CH:18][CH:19]=[CH:20][CH:21]=3)[N:9]2[C:1]([C:2]2[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=2)=[O:8])=[CH:36][CH:35]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

6

反応物 4

HCID 25517Ammonium ChlorideHCID 1650214-Methoxybenzyl bromideHCID 2733832Lithium hexamethyldisilazaneHCID 13818180(2S,4R)-3-Benzoyl-4-methyl-2-phenyl-1,3-oxazolidin-5-one

生成物 1

HCID 44596871HCID 44596871、化合物収率 82%

試薬・触媒・溶媒 1

HCID 8028
Tetrahydrofuran
溶媒
2 回

反応条件

温度
-78 °C

実験手順

Compound 2.2 (6.35 g, 0.023 mol) in 50 mL of THF at −78° C. was added over 20 min to a solution of LHMDS in THF (25 mL of 1 M solution in THF). After 10 min, 1.1 eq. of 4-methoxybenzyl bromide (25 mmol, 5 mL) was added in one portion. The mixture was stirred at −78° C. for 3 h and then room temperature overnight. Saturated NH4Cl solution was added, the THF was removed in vacuo, 100 mL of Et2O was added and the phases were separated. The organic layer was washed with 50 mL of NaHCO3 solution and brine. After drying (Na2SO4), filtration and removal of the solvent, the residue was purified by chromatography using Si Gel ISCO column with 9% EtOAc in Hexanes as eluent. Concentration of the product fractions gave 7.4 g (82%) of 2.3 as a white solid. MP 128-129° C.; [α]25D=−260 (c 0.8, MeOH); 1H NMR δ 7.27 (1H, d, J=8 Hz), 7.19-7.14 (2H, m), 7.09-7.05 (4H, m), 6.94 (d, 2H, J=8 Hz), 6.76-6.72 (m, 4H), 5.68 (s, 1H), 3.88 (d, 1H, J=12 Hz), 3.86 (s, 3H), 3.27 (d, 1H, J=12 Hz), 2.14 (s, 3H); C NMR 175.1, 169.4, 159.6, 136.7, 131.5, 130.1, 130.0, 128.8, 128.7, 128.2, 127.2, 126.3, 114.6, 90.7, 65.9, 55.8, 40.5, 24.6; ESI MS 402 (M+1).

後処理

  1. customroom temperature overnight
  2. customthe THF was removed in vacuo, 100 mL of Et2O
  3. additionwas added
  4. customthe phases were separated
  5. washThe organic layer was washed with 50 mL of NaHCO3 solution and brine
  6. customAfter drying
  7. filtration(Na2SO4), filtration and removal of the solvent
  8. customthe residue was purified by chromatography

出典と根拠

ORDレコード
ord-b3832f035a014ba69c903abd40c6799e
出典データセット
uspto-grants-2011_11
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08048895B2

反応ノート

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