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Aluminium lithium hydride → HCID 86684769、化合物

HRID 579160
ノート
印刷プレビュー

反応式

HRID 579160 の反応式
[CH2:1]([O:8][C:9](=[O:24])[NH:10][C@H:11]([CH:18]1[CH2:23][CH2:22][CH2:21][CH2:20][CH2:19]1)[C:12](=[O:17])N(OC)C)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.[H-].[H-].[H-].[H-].[Li+].[Al+3]>C1COCC1>[CH2:1]([O:8][C:9](=[O:24])[NH:10][C@H:11]([CH:18]1[CH2:19][CH2:20][CH2:21][CH2:22][CH2:23]1)[CH:12]=[O:17])[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

4

反応物 2

HCID 21226445Aluminium lithium hydride2 回HCID 86684768HCID 86684768、化合物

生成物 1

HCID 86684769HCID 86684769、化合物収率 99%

試薬・触媒・溶媒 1

HCID 8028Tetrahydrofuran溶媒

反応条件

温度
0 °C

実験手順

To a solution of [(R)-Cyclohexyl-(methoxy-methyl-carbamoyl)-methyl]-carbamic acid benzyl ester (27 g, 82 mmol) in THF (400 mL) at −20° C. was slowly added LiAlH4 (4.06 g, 106 mmol, 1.3 equiv). LiAlH4 was freshly ground from pellet purchased from Aldrich. During addition, the internal temperature was carefully monitored and did not rise above 0° C. After addition the mixture was stirred at 0° C. and the reaction was monitored by TLC and LCMS. After 1 hour, the reaction solution was cooled at −10° C. and quenched by slow addition of sat. aq. KHSO4 solution until pH=5. The mixture was partitioned between water and EtOAc. The phases were separated and the organic layer was concentrated. The residue was dissolved in EtOAc and the solution was washed with water, brine, dried over Na2SO4 and concentrated to give product ((R)-1-Cyclohexyl-2-oxo-ethyl)-carbamic acid benzyl ester 22 g (99%). The material was continued to next step with no further purification.

後処理

  1. customat −20° C.
  2. additionDuring addition
  3. customdid not rise above 0° C
  4. additionAfter addition the mixture
  5. temperaturethe reaction solution was cooled at −10° C.
  6. customquenched by slow addition of sat. aq. KHSO4 solution until pH=5
  7. customThe mixture was partitioned between water and EtOAc
  8. customThe phases were separated
  9. concentrationthe organic layer was concentrated
  10. dissolutionThe residue was dissolved in EtOAc
  11. washthe solution was washed with water, brine
  12. dry with materialdried over Na2SO4
  13. concentrationconcentrated

出典と根拠

ORDレコード
ord-ad54c1f563c247549f07b896c7a529f7
出典データセット
uspto-grants-2015_05
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US09040690B2

反応ノート

読み込み中…

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