Triethylamine → HCID 69659652、化合物

HRID 722744ノート

反応式

HRID 722744 の反応式
[C:1]1([S:7]([N:10]2[CH2:35][CH:14]3[CH2:15][CH2:16][CH2:17][CH2:18][CH:19]([NH:22][C:23]([C:25]4[C:34]5[C:29](=[CH:30][CH:31]=[CH:32][CH:33]=5)[CH:28]=[CH:27][N:26]=4)=[O:24])[C:20](=[O:21])[N:13]3[CH:12]([C:36](O)=[O:37])[CH2:11]2)(=[O:9])=[O:8])[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.CCN=C=NCCCN(C)C.Cl.C1C=CC2N(O)N=NC=2C=1.[NH2:61][CH:62]([CH2:77][C:78]([O:80][C:81]([CH3:84])([CH3:83])[CH3:82])=[O:79])[C:63](=[O:76])[CH2:64][O:65][C:66](=[O:75])[C:67]1[C:72]([CH3:73])=[CH:71][CH:70]=[CH:69][C:68]=1[CH3:74].C(N(CC)CC)C>ClCCl>[C:1]1([S:7]([N:10]2[CH2:35][CH:14]3[CH2:15][CH2:16][CH2:17][CH2:18][CH:19]([NH:22][C:23]([C:25]4[C:34]5[C:29](=[CH:30][CH:31]=[CH:32][CH:33]=5)[CH:28]=[CH:27][N:26]=4)=[O:24])[C:20](=[O:21])[N:13]3[CH:12]([C:36]([NH:61][CH:62]([CH2:77][C:78]([O:80][C:81]([CH3:84])([CH3:83])[CH3:82])=[O:79])[C:63](=[O:76])[CH2:64][O:65][C:66](=[O:75])[C:67]3[C:72]([CH3:73])=[CH:71][CH:70]=[CH:69][C:68]=3[CH3:74])=[O:37])[CH2:11]2)(=[O:8])=[O:9])[CH:2]=[CH:3][CH:4]=[CH:5][CH:6]=1

参加物

7

反応物 5

HCID 8471TriethylamineHCID 757711-HydroxybenzotriazoleHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 21882356HCID 21882356、化合物HCID 235714112,6-Dimethyl-benzoic acid 3-amino-4-tert-butoxycarbonyl-2-oxo-butyl ester

生成物 1

HCID 69659652HCID 69659652、化合物

試薬・触媒・溶媒 1

HCID 6344Dichloromethane溶媒

実験手順

To a solution of 2-benzenesulfonyl-6-[(isoquinoline-1-carbonyl)-amino]-5-oxo-decahydro-2,4a-diaza-benzocyclooctene-4-carboxylic acid, 111, (124 mg, 0.23 mmol) in dichloromethane is added EDCl (191 mg, 1 mmol), HOBt (135 mg, 1 mmol), 2,6-dimethyl-benzoic acid 3-amino-4-tert-butoxycarbonyl-2-oxo-butyl ester (200 mg, 0.62 mmol), and triethylamine (0.15 mL, 1 mmol). After consumption of the starting material, the reaction is diluted with EtOAc and washed with water, 1N HCl, saturated NaHCO3, and brine. The organic layer is concentrated in vacuo and the crude residue obtained is used directly in the next step without purification.

後処理

  1. customAfter consumption of the starting material
  2. additionthe reaction is diluted with EtOAc
  3. washwashed with water, 1N HCl, saturated NaHCO3, and brine
  4. concentrationThe organic layer is concentrated in vacuo

出典と根拠

ORDレコード
ord-44bc560f9f624ba8809bd0a49f80d73c
出典データセット
uspto-grants-2006_11
特許番号
US07138395B2

反応ノート

読み込み中…