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Hydrochloric Acid → [5-(Trifluoromethyl)pyridin-3-yl]boronic acid

HRID 81494
ノート
印刷プレビュー

反応式

HRID 81494 の反応式
C(O[B:4]([O:8]CC)[O:5]CC)C.Br[C:12]1[CH:13]=[N:14][CH:15]=[C:16]([C:18]([F:21])([F:20])[F:19])[CH:17]=1.C([Li])CCC.Cl.CCOC(C)=O.CCCC(C)C>C1COCC1>[F:19][C:18]([F:21])([F:20])[C:16]1[CH:17]=[C:12]([B:4]([OH:5])[OH:8])[CH:13]=[N:14][CH:15]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

7

反応物 5

HCID 313Hydrochloric AcidHCID 9009Triethyl borateHCID 111279913-Bromo-5-(trifluoromethyl)pyridineHCID 21882781Isohexane ethyl acetateHCID 178418339Butyllithium

生成物 1

HCID 45158900[5-(Trifluoromethyl)pyridin-3-yl]boronic acid

試薬・触媒・溶媒 1

HCID 8028
Tetrahydrofuran
溶媒

反応条件

温度
-78 °C

実験手順

Triethylborate (24 ml, 139 mmol) is added to a solution of 3-bromo-5-trifluoromethyl-pyridine (30 g, 133 mmol) in THF (300 ml) and the resulting pale yellow solution is cooled to −78° C. A solution of 1.6 M n-butyl lithium in hexanes (97 ml, 139 mmol) is added via cannula dropwise over 40 minutes, keeping the temperature below −65° C. Once addition is complete, the reaction mixture is allowed to warm slowly to room temperature and stirred for 1 hour. 1M HCl (200 ml) is added and the reaction mixture stirred for 15 minutes. The layers are separated and the organic layer is washed with 1M HCl (200 ml). The aqueous layers are combined and washed with EtOAc (2×250 ml). The pH of the aqueous phase is adjusted by the addition of 2M NaOH, and extracted with EtOAc (2×250 ml). Concentration in vacuo affords a solid, which is recyrstallised from EtOAc/iso-hexane to yield the title compound as a yellow solid [M+H]+ 192.

後処理

  1. customthe temperature below −65° C
  2. additionOnce addition
  3. temperatureto warm slowly to room temperature
  4. stirringthe reaction mixture stirred for 15 minutes
  5. customThe layers are separated
  6. washthe organic layer is washed with 1M HCl (200 ml)
  7. washwashed with EtOAc (2×250 ml)
  8. additionThe pH of the aqueous phase is adjusted by the addition of 2M NaOH
  9. extractionextracted with EtOAc (2×250 ml)
  10. concentrationConcentration in vacuo
  11. customaffords a solid, which

出典と根拠

ORDレコード
ord-50ae31e39c944dd8a487edfe853fb192
出典データセット
uspto-grants-2014_09
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08846687B2

反応ノート

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