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Trifluoroacetic acid → 2-((1R)-1-((2R)-2-amino-3-(2-naphthyl)propionylamino)-2-(2-naphthyl)ethyl)-5-phenyl-1,3-thiazole-4-carboxylic acid amide

HRID 849889
ノート
印刷プレビュー

反応式

HRID 849889 の反応式
C(OC(=O)[NH:7][C@@H:8]([C:20](=[O:48])[NH:21][C@@H:22]([C:34]1[S:35][C:36]([C:42]2[CH:47]=[CH:46][CH:45]=[CH:44][CH:43]=2)=[C:37]([C:39](=[O:41])[NH2:40])[N:38]=1)[CH2:23][C:24]1[CH:33]=[CH:32][C:31]2[C:26](=[CH:27][CH:28]=[CH:29][CH:30]=2)[CH:25]=1)[CH2:9][C:10]1[CH:19]=[CH:18][C:17]2[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=2)[CH:11]=1)(C)(C)C.FC(F)(F)C(O)=O>C(Cl)Cl>[NH2:7][C@H:8]([CH2:9][C:10]1[CH:19]=[CH:18][C:17]2[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=2)[CH:11]=1)[C:20]([NH:21][C@@H:22]([C:34]1[S:35][C:36]([C:42]2[CH:47]=[CH:46][CH:45]=[CH:44][CH:43]=2)=[C:37]([C:39]([NH2:40])=[O:41])[N:38]=1)[CH2:23][C:24]1[CH:33]=[CH:32][C:31]2[C:26](=[CH:27][CH:28]=[CH:29][CH:30]=2)[CH:25]=1)=[O:48]
参加物実験手順後処理出典と根拠反応ノート

参加物

4

反応物 2

HCID 6422Trifluoroacetic acidHCID 53997581((1R)-1-((1R)-1-(4-Carbamoyl-5-phenyl-1,3-thiazol-2-yl)-2-(2-naphthyl)ethylcarbamoyl)-2-(2-naphthyl)ethyl)carbamic acid tert-butylester

生成物 1

HCID 542665712-((1R)-1-((2R)-2-amino-3-(2-naphthyl)propionylamino)-2-(2-naphthyl)ethyl)-5-phenyl-1,3-thiazole-4-carboxylic acid amide収率 82.8%

試薬・触媒・溶媒 1

HCID 6344Dichloromethane溶媒

実験手順

((1R)-1-((1R)-1-(4-Carbamoyl-5-phenyl-1,3-thiazol-2-yl)-2-(2-naphthyl)ethylcarbamoyl)-2-(2-naphthyl)ethyl)carbamic acid tert-butylester (0.22 g; 0.328 mmol) was dissolved in methylene chloride (2.5 ml) and trifluoroacetic acid (2.5 ml) was added. The reaction mixture was stirred 1 h at room temperature and the solvent was removed in vacuo. The residue was dissolved in methylene chloride and evaporated (2×5 ml). The residue was dissolved in methylene chloride (10 ml) and washed with sodium hydrogencarbonate (satd; 10 ml), water (10 ml) and dried (magnesium sulfate). The solvent was removed in vacuo to afford 0.155 g of 2-((1R)-1-((2R)-2-amino-3-(2-naphthyl)propionylamino)-2-(2-naphthyl)ethyl)-5-phenyl-1,3-thiazole-4-carboxylic acid amide.

後処理

  1. customthe solvent was removed in vacuo
  2. dissolutionThe residue was dissolved in methylene chloride
  3. customevaporated (2×5 ml)
  4. dissolutionThe residue was dissolved in methylene chloride (10 ml)
  5. washwashed with sodium hydrogencarbonate (satd; 10 ml), water (10 ml)
  6. dry with materialdried (magnesium sulfate)
  7. customThe solvent was removed in vacuo

出典と根拠

ORDレコード
ord-c2e465fe8942436e84b2e4c83cbae898
出典データセット
uspto-grants-2000_01
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US06013658

反応ノート

読み込み中…

このページの内容参加物実験手順後処理出典と根拠反応ノート