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1-Hydroxybenzotriazole → HCID 19024865, 화합물

HRID 1034084
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인쇄 미리보기

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HRID 1034084 반응식
Cl.CN(C)CCCN=C=NCC.[C:13]([CH:16]([C:43]1[CH:48]=[CH:47][C:46]([CH2:49][CH:50]([CH3:52])[CH3:51])=[CH:45][CH:44]=1)[O:17][C:18]1[CH:42]=[CH:41][C:21]([C:22]([C:24]2[C:32]3[C:27](=[CH:28][CH:29]=[CH:30][CH:31]=3)[N:26]([CH2:33][CH2:34][CH2:35][C:36]([O:38][CH2:39][CH3:40])=[O:37])[CH:25]=2)=[O:23])=[CH:20][CH:19]=1)([OH:15])=O.[CH2:53]([C:57]1[CH:63]=[CH:62][C:60]([NH2:61])=[CH:59][CH:58]=1)[CH:54]([CH3:56])[CH3:55].ON1C2C=CC=CC=2N=N1>ClCCl>[CH2:49]([C:46]1[CH:47]=[CH:48][C:43]([CH:16]([C:13](=[O:15])[NH:61][C:60]2[CH:62]=[CH:63][C:57]([CH2:53][CH:54]([CH3:56])[CH3:55])=[CH:58][CH:59]=2)[O:17][C:18]2[CH:19]=[CH:20][C:21]([C:22]([C:24]3[C:32]4[C:27](=[CH:28][CH:29]=[CH:30][CH:31]=4)[N:26]([CH2:33][CH2:34][CH2:35][C:36]([O:38][CH2:39][CH3:40])=[O:37])[CH:25]=3)=[O:23])=[CH:41][CH:42]=2)=[CH:44][CH:45]=1)[CH:50]([CH3:51])[CH3:52]
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 757711-HydroxybenzotriazoleHCID 1216274-IsobutylanilineHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 19024864HCID 19024864, 화합물

생성물 1

HCID 19024865HCID 19024865, 화합물수율 97.7%

시약·촉매·용매 1

HCID 6344
Dichloromethane
용매

반응 조건

온도
25 °C

실험 절차

1-(3-Dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride (30 mg) was added to a mixture of ethyl 4-[3-[4-[(carboxy)(4-isobutylphenyl)methoxy]benzoyl]indol-1-yl]butyrate (70 mg), 4-isobutylaniline (20 mg) and 1-hydroxybenzotriazole (20 mg) in dichloromethane (3 ml). After stirred at 25° C. for 4 hours, the mixture was partitioned between ethyl acetate and 1N hydrochloric acid. The organic layer was separated, washed with water and brine, and dried over magnesium sulfate. After evaporation of the solvent, the residue was chromatographed on silica gel (5 g) eluting with chloroform to give ethyl 4-[3-[4-[(4-isobutylphenyl)[(4-isobutylphenyl)carbamoyl]methoxy]benzoyl]indol-1-yl]butyrate (85 mg) as an oil.

후처리

  1. customthe mixture was partitioned between ethyl acetate and 1N hydrochloric acid
  2. customThe organic layer was separated
  3. washwashed with water and brine
  4. dry with materialdried over magnesium sulfate
  5. customAfter evaporation of the solvent
  6. customthe residue was chromatographed on silica gel (5 g)
  7. washeluting with chloroform

출처 및 근거

ORD 기록
ord-a847ba0db4ce4b5c83efa1cdd273bb11
출처 데이터셋
uspto-grants-1994_05
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05312829

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