홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

4-Methylmorpholine → Boc-Ala-Ala-NH-(CH2)4-OH

HRID 1044646
노트
인쇄 미리보기

반응식

HRID 1044646 반응식
[C:1]([NH:8][C@H:9]([C:11]([NH:13][C@H:14]([C:16]([OH:18])=O)[CH3:15])=[O:12])[CH3:10])([O:3][C:4]([CH3:7])([CH3:6])[CH3:5])=[O:2].CN1CCOCC1.ClC(OCC)=O.[NH2:32][CH2:33][CH2:34][CH2:35][CH2:36][OH:37]>C1COCC1>[NH:8]([C:1]([O:3][C:4]([CH3:5])([CH3:6])[CH3:7])=[O:2])[C@H:9]([C:11]([NH:13][C@H:14]([C:16]([NH:32][CH2:33][CH2:34][CH2:35][CH2:36][OH:37])=[O:18])[CH3:15])=[O:12])[CH3:10]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 79724-Methylmorpholine2회HCID 10928Ethyl chloroformateHCID 258684-Amino-1-butanolHCID 6992569N-((1,1-Dimethylethoxy)carbonyl)-L-alanyl-L-alanine

생성물 1

HCID 59537080Boc-Ala-Ala-NH-(CH2)4-OH수율 75%

시약·촉매·용매 1

HCID 8028
Tetrahydrofuran
용매
2회

실험 절차

To a vigorously stirring solution of Boc-(Ala)2-OH (0.9 gm, 3.46 mmol) and NMM (0.57 mL, 5.2 mmol) in THF (20 mL) cooled to −15° C. was added under N2 atmosphere ethyl chloroformate (ECF) (372 μL, 3.56 mmol) and stirred for 2 min. A solution of H2N(CH2)4OH (462 mg, 5.19 mmol) in THF (5 mL) was added to the mixture followed by NMM (950 μL, 8.65 mmol) and the mixture was warmed to r.t. and stirred until silica gel TLC indicated complete consumption of the starting acid (eluting solvent—MeOH:DCM—1:10, Rf—0.45) (˜8 h). The solvent was evaporated, and the residue was diluted with EtOAc and washed with brine, water, saturated solutions of citric acid and NaHCO3, and the organic layer was dried using NaHSO4, and the solvent was removed under vacuum to yield a residue which was purified using silica gel flash column chromatography—Hexanes:EtOAc—1:3; to give the desired product in 75% yield (858 mg) as a solid—m.p.—102-104° C.

후처리

  1. stirringstirred until silica gel
  2. customconsumption of the starting acid (eluting solvent—MeOH:DCM—1:10, Rf—0.45) (˜8 h)
  3. customThe solvent was evaporated
  4. additionthe residue was diluted with EtOAc
  5. washwashed with brine, water, saturated solutions of citric acid and NaHCO3
  6. customthe organic layer was dried
  7. customthe solvent was removed under vacuum
  8. customto yield a residue which
  9. customwas purified

출처 및 근거

ORD 기록
ord-bd9d8cd11099458aa2f8c3dce2987f7f
출처 데이터셋
uspto-grants-2013_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08563686B2

반응 노트

불러오는 중…

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트