홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Nitromethane → Benzenepropanoic acid, b-(nitromethyl)-, methyl ester

HRID 1045677
노트
인쇄 미리보기

반응식

HRID 1045677 반응식
[C:1]([O:11][CH3:12])(=[O:10])[CH:2]=[CH:3][C:4]1[CH:9]=[CH:8][CH:7]=[CH:6][CH:5]=1.[N+:13]([CH3:16])([O-:15])=[O:14]>>[CH3:12][O:11][C:1](=[O:10])[CH2:2][CH:3]([C:4]1[CH:5]=[CH:6][CH:7]=[CH:8][CH:9]=1)[CH2:16][N+:13]([O-:15])=[O:14]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

3

반응물 2

HCID 6375NitromethaneHCID 76442-Propenoic acid, 3-phenyl-, methyl ester

생성물 1

HCID 10537045Benzenepropanoic acid, b-(nitromethyl)-, methyl ester수율 59%

실험 절차

A solution of methyl cinnamate (4.93 g, 30.4 mmol) and teteramethylguanidine (3.99 g, 34.6 mmol) in nitromethane (30 ml) was stirred for 6 hours at 90° C. After removal of the solvent under reduced pressure, the residue was partitioned between water and ethyl acetate, and the organic layer was washed with water and brine and then dried over sodium sulfate. The organic solvents were removed under reduced pressure, and the residue was purified by silica gel column chromatography (eluent; hexane/ethyl acetate=4/1) to afford 4-nitro-3-phenyl-butyric acid methyl ester (4.02 g, 59%)

후처리

  1. customAfter removal of the solvent under reduced pressure
  2. customthe residue was partitioned between water and ethyl acetate
  • washthe organic layer was washed with water and brine
  • dry with materialdried over sodium sulfate
  • customThe organic solvents were removed under reduced pressure
  • customthe residue was purified by silica gel column chromatography (eluent; hexane/ethyl acetate=4/1)
  • 출처 및 근거

    ORD 기록
    ord-c8e60e5b5cfc4570bdec6bafcfa9603c
    출처 데이터셋
    uspto-grants-2013_10
    DOI
    10.6084/m9.figshare.5104873.v1
    특허 번호
    US08569294B2

    반응 노트

    불러오는 중…

    이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트