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Thionyl Chloride → HCID 21417396, 화합물

HRID 1076779
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HRID 1076779 반응식
S(Cl)([Cl:3])=O.[C:5]1([C:11]#[C:12][C:13]2[CH:20]=[CH:19][C:16]([CH2:17]O)=[CH:15][CH:14]=2)[CH:10]=[CH:9][CH:8]=[CH:7][CH:6]=1>C(Cl)(Cl)Cl>[C:5]1([C:11]#[C:12][C:13]2[CH:20]=[CH:19][C:16]([CH2:17][Cl:3])=[CH:15][CH:14]=2)[CH:10]=[CH:9][CH:8]=[CH:7][CH:6]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 24386Thionyl ChlorideHCID 15881239[4-(Phenylethynyl)phenyl]methanol

생성물 1

HCID 21417396HCID 21417396, 화합물

시약·촉매·용매 1

HCID 6212Chloroform용매

실험 절차

Thionyl chloride, 7 ml., is added dropwise to a stirred solution of 6.0 g. (0.0288 mole) of 4-(phenylethynyl) benzyl alcohol in 100 ml. of dry chloroform at room temperature and the mixture is stirred for 6 hours. Solvent is evaporated under reduced pressure and at a temperature below 50°. The residue is freed from traces of thionyl chloride by dissolution in dry benzene and evaporation under reduced pressure. This process is repeated and the residual solid product is purified by sublimation in vacuo; m.p. 61.5°-63.5°C.

후처리

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  1. addition, is added dropwise to a stirred solution of 6.0 g
  2. customSolvent is evaporated under reduced pressure and at a temperature below 50°
  3. dissolutionThe residue is freed from traces of thionyl chloride by dissolution in dry benzene
  4. customevaporation under reduced pressure
  5. customthe residual solid product is purified by sublimation in vacuo

출처 및 근거

ORD 기록
ord-32c99f0901254f3e85902a397b9fcfba
출처 데이터셋
uspto-grants-1976_05
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US03957871

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