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HCID 178503546, 화합물 → HCID 178524206, 화합물

HRID 1094492
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HRID 1094492 반응식
[OH:1][C:2]1[N:7]=[C:6](SC)[N:5]=[C:4]([CH2:10][C:11]2[CH:12]=[C:13]3[C:18](=[CH:19][CH:20]=2)[C:17]([C:21]([OH:23])=[O:22])=[CH:16][CH:15]=[CH:14]3)[CH:3]=1>[Ni].CCO.O>[OH:1][C:2]1[N:7]=[CH:6][N:5]=[C:4]([CH2:10][C:11]2[CH:12]=[C:13]3[C:18](=[CH:19][CH:20]=2)[C:17]([C:21]([OH:23])=[O:22])=[CH:16][CH:15]=[CH:14]3)[CH:3]=1
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5

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HCID 178503546HCID 178503546, 화합물

생성물 1

HCID 178524206HCID 178524206, 화합물

시약·촉매·용매 3

HCID 935Nickel촉매HCID 702Ethanol용매2회HCID 962Water용매

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온도
80 °C

실험 절차

29 g Raney Nickel in EtOH are added to a solution of 5.08 mMol 6-(6-hydroxy-2-methylsulfanyl-pyrimidin-4-ylmethyl)-naphthalene-1-carboxylic acid in 220 ml EtOH and 170 ml water. The mixture is stirred for 3.5 h at 80° C., filtered hot and the residue is extensively washed with EtOH/H2O 1:1. Partial concentration in vacuo, acidification of the residue with 1 N HCl (pH=1), filtration of the precipitated product, washing with 50 ml 0.1 N HCl and drying (HV; 90° C.) gives the title compound. Additional product can be isolated from the filtrate by extraction with 3 Portions of EtOAc, washing of the organic layers with brine, drying (Na2SO4), concentration and chromatography (Combi Flash; CH2Cl2→CH2Cl2/MeOH+0.5% HOAc 19:1): TLC (CH2Cl2/MeOH+0.5% HOAc 9:1): Rf=0.17.

후처리

  1. filtrationfiltered hot
  2. washthe residue is extensively washed with EtOH/H2O 1:1
  3. concentrationPartial concentration in vacuo, acidification of the residue
  4. filtrationwith 1 N HCl (pH=1), filtration of the precipitated product
  5. washwashing with 50 ml 0.1 N HCl
  6. customdrying (HV; 90° C.)

출처 및 근거

ORD 기록
ord-def1c9a2f5be495dbc84a4eaf8794b6d
출처 데이터셋
uspto-grants-2012_03
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08133886B2

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