Trifluoromethane → Chf3 CF4

HRID 1095207

반응식

HRID 1095207 반응식
[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]>>[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]

참가 물질

3

실험 절차

SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.

후처리

  1. customThe results of SEM morphology measurements

출처 및 근거

ORD 기록
ord-237bd32383524a8aa3a3e8229d4feb84
출처 데이터셋
uspto-grants-2012_03
특허 번호
US08137569B2

연결된 노트

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