Trifluoromethane → Chf3 CF4
반응식
[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]>>[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]참가 물질
3
실험 절차
SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.
후처리
- customThe results of SEM morphology measurements
출처 및 근거
- ORD 기록
- ord-237bd32383524a8aa3a3e8229d4feb84
- 출처 데이터셋
- uspto-grants-2012_03
- 특허 번호
- US08137569B2
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