반응식
[Cl:1][C:2]1[N:10](CC=C)[C:9]2[C:8](=[O:14])[NH:7][C:6](=[O:15])[N:5]([CH2:16][CH2:17][CH3:18])[C:4]=2[N:3]=1.[C:19]1([CH2:25][C:26]2[O:30][N:29]=[C:28]([CH2:31][CH2:32][CH2:33]O)[N:27]=2)[CH:24]=[CH:23][CH:22]=[CH:21][CH:20]=1.C1C=CC(P(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1.C1C=CC(COC(/N=N/C(OCC2C=CC=CC=2)=O)=O)=CC=1.N1CCOCC1>C1COCC1.C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[Cl:1][C:2]1[NH:10][C:9]2[C:8](=[O:14])[N:7]([CH2:33][CH2:32][CH2:31][C:28]3[N:27]=[C:26]([CH2:25][C:19]4[CH:24]=[CH:23][CH:22]=[CH:21][CH:20]=4)[O:30][N:29]=3)[C:6](=[O:15])[N:5]([CH2:16][CH2:17][CH3:18])[C:4]=2[N:3]=1참가 물질
반응물 5
생성물 1
시약·촉매·용매 2
실험 절차
A solution of 8-chloro-7-(2-propen-1-yl)-3-propyl-3,7-dihydro-1H-purine-2,6-dione (200 mg, 0.74 mmol) in THF (4 ml) was treated with 3-[5-(phenylmethyl)-1,2,4-oxadiazol-3-yl]-1-propanol (195 mg, 0.89 mmol) and PPh3 (254 mg, 0.96 mmol). DBAD (223 mg, 0.96 mmol) was added in one portion and the mixture was left to stir at rt under nitrogen for 18 h. The mixture was partitioned between EtOAc and 2M HCl (aq). The organic layer was separated, washed with brine, dried (MgSO4) and concentrated by high vacuum. The crude product was purified on a silica SPE column using a 0-70% cyclohexane/EtOAc gradient. The product fractions were combined, concentrated by high vacuum and purified on a silica SPE column using a 0-60% cyclohexane/EtOAc gradient. The product fractions were combined and concentrated then dissolved in anhydrous THF (4 ml). The solution was degassed by high vacuum then Pd(PPh3)4 (61 mg, 0.053 mmol) and morpholine (460 μl, 5.3 mmol) were added and the mixture left to stir at rt under nitrogen for 1 day. The mixture was partitioned between EtOAc and 2M HCl (aq). The organic layer was separated, washed with brine, dried (MgSO4) and concentrated by high vacuum. The crude product was purified by an aminopropyl SPE using MeOH to load the compound onto the column and wash through the impurities then a 2-4% AcOH/MeOH gradient to elute the product. The product fractions were combined and concentrated to leave the title compound as a white solid (36 mg, 11%).
후처리
- waitthe mixture was left
- customThe mixture was partitioned between EtOAc and 2M HCl (aq)
- customThe organic layer was separated
- washwashed with brine
- dry with materialdried (MgSO4)
- concentrationconcentrated by high vacuum
- customThe crude product was purified on a silica SPE column
- concentrationconcentrated by high vacuum
- custompurified on a silica SPE column
- concentrationconcentrated
- dissolutionthen dissolved in anhydrous THF (4 ml)
- customThe solution was degassed by high vacuum
- waitthe mixture left
- stirringto stir at rt under nitrogen for 1 day
- customThe mixture was partitioned between EtOAc and 2M HCl (aq)
- customThe organic layer was separated
- washwashed with brine
- dry with materialdried (MgSO4)
- concentrationconcentrated by high vacuum
- customThe crude product was purified by an aminopropyl SPE
- washwash through the impurities
- washa 2-4% AcOH/MeOH gradient to elute the product
- concentrationconcentrated
출처 및 근거
- ORD 기록
- ord-9197bbb349704dbd9abcffc5d4c0ef97
- 출처 데이터셋
- uspto-grants-2012_03
- 특허 번호
- US08143264B2
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